Multiscale Computational Fluid Dynamics Modeling: Parallelization and Application to Design and Control of Plasma-Enhanced Chemical Vapor Deposition of Thin Film Solar Cells

Today, plasma-enhanced chemical vapor deposition (PECVD) remains the dominant processing method for the manufacture of silicon thin films due to inexpensive production and low operating temperatures. Nonetheless, thickness non-uniformity continues to prevent the deposition of high quality thin film...

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Hlavný autor:	Crose, Marquis Grant
Médium:	Dissertation
Jazyk:	English
Vydavateľské údaje:	ProQuest Dissertations & Theses 01.01.2018
Predmet:	Chemical engineering Computational chemistry Computational physics
ISBN:	0438078047, 9780438078048
On-line prístup:	Získať plný text
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