Virtual Measurement Combine OCD and FDC Through Optimized Random Forest Machine Learning Algorithm Assists on Post Etching Monitor

Etching is an important process in semiconductor technology. Inconsistency in post Etching wafer uniformity and geometry affects downstream process margin which leads to various yield issues. Post etching monitor such as top, middle or bottom critical dimension is necessary to ensure the process mee...

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Bibliographic Details

Published in:	2024 Conference of Science and Technology for Integrated Circuits (CSTIC) pp. 1 - 3
Main Authors:	Yang, Qingyun, Meng, Michael, Zheng, Alex, Lin, Paul, Gai, Kevin, Chen, Osim
Format:	Conference Proceeding
Language:	English
Published:	IEEE 17.03.2024
Subjects:	Data models Etching FDC Machine Learning (ML) Metrology OCD Prediction algorithms Predictive models Process control Random Forest(RF) Semiconductor device measurement Virtual Measurement(VM)
Online Access:	Get full text
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