APA (7th ed.) Citation

Slaoui, A., Monna, R., Angermeier, D., Bourdais, S., & Muller, J. (1997, January). Polycrystalline silicon films formation on foreign substrates by a rapid thermal-CVD technique. Conference Record of the Twenty Sixth IEEE Photovoltaic Specialists Conference - 1997, 627-630. https://doi.org/10.1109/PVSC.1997.654167

Chicago Style (17th ed.) Citation

Slaoui, A., R. Monna, D. Angermeier, S. Bourdais, and J.C Muller. "Polycrystalline Silicon Films Formation on Foreign Substrates by a Rapid Thermal-CVD Technique." Conference Record of the Twenty Sixth IEEE Photovoltaic Specialists Conference - 1997 Jan. 1997: 627-630. https://doi.org/10.1109/PVSC.1997.654167.

MLA (9th ed.) Citation

Slaoui, A., et al. "Polycrystalline Silicon Films Formation on Foreign Substrates by a Rapid Thermal-CVD Technique." Conference Record of the Twenty Sixth IEEE Photovoltaic Specialists Conference - 1997, Jan. 1997, pp. 627-630, https://doi.org/10.1109/PVSC.1997.654167.