Yang, J., McArdle, C., & Daniels, S. (2014). Similarity Ratio Analysis for Early Stage Fault Detection with Optical Emission Spectrometer in Plasma Etching Process. PloS one, 9(4), e95679. https://doi.org/10.1371/journal.pone.0095679
Citácia podle Chicago (17th ed.)Yang, Jie, Conor McArdle, a Stephen Daniels. "Similarity Ratio Analysis for Early Stage Fault Detection with Optical Emission Spectrometer in Plasma Etching Process." PloS One 9, no. 4 (2014): e95679. https://doi.org/10.1371/journal.pone.0095679.
Citácia podľa MLA (8th ed.)Yang, Jie, et al. "Similarity Ratio Analysis for Early Stage Fault Detection with Optical Emission Spectrometer in Plasma Etching Process." PloS One, vol. 9, no. 4, 2014, p. e95679, https://doi.org/10.1371/journal.pone.0095679.
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