Tuning Wall Thicknesses in Mesoporous Silica Films for Optimization of Optical Anti-Reflective Properties
This work reports the fabrication of mesoporous silica films with controllable wall thicknesses by spin coating of precursor solutions consisting of polystyrene-block-polybutadiene-block-polystyrene based triblock copolymers (Hydrogenated methyl Styrene Ethylene Butadiene methyl Styrene, HmSEBmS) an...
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| Published in: | Journal of nanoscience and nanotechnology Vol. 18; no. 1; p. 100 |
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| Main Authors: | , , , , , , , , , , , |
| Format: | Journal Article |
| Language: | English |
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United States
01.01.2018
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| ISSN: | 1533-4880 |
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| Abstract | This work reports the fabrication of mesoporous silica films with controllable wall thicknesses by spin coating of precursor solutions consisting of polystyrene-block-polybutadiene-block-polystyrene based triblock copolymers (Hydrogenated methyl Styrene Ethylene Butadiene methyl Styrene, HmSEBmS) and tetraethyl orthosilicate (TEOS) followed by calcination in air at 600 °C, for optical anti-reflection films. By changing the relative weight of the triblock polymer to TEOS, the pore-to-pore distance in the mesoporous silica film can be controlled without significantly affecting the size of the mesopores, thus, enabling effective control of the refractive index and porosity of the films. In terms of optical properties, the transmittance of the fabricated mesoporous silica film is approximately 3.3% higher than that of the uncoated glass substrate in the wavelength range of 400 to 750 nm. |
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| AbstractList | This work reports the fabrication of mesoporous silica films with controllable wall thicknesses by spin coating of precursor solutions consisting of polystyrene-block-polybutadiene-block-polystyrene based triblock copolymers (Hydrogenated methyl Styrene Ethylene Butadiene methyl Styrene, HmSEBmS) and tetraethyl orthosilicate (TEOS) followed by calcination in air at 600 °C, for optical anti-reflection films. By changing the relative weight of the triblock polymer to TEOS, the pore-to-pore distance in the mesoporous silica film can be controlled without significantly affecting the size of the mesopores, thus, enabling effective control of the refractive index and porosity of the films. In terms of optical properties, the transmittance of the fabricated mesoporous silica film is approximately 3.3% higher than that of the uncoated glass substrate in the wavelength range of 400 to 750 nm.This work reports the fabrication of mesoporous silica films with controllable wall thicknesses by spin coating of precursor solutions consisting of polystyrene-block-polybutadiene-block-polystyrene based triblock copolymers (Hydrogenated methyl Styrene Ethylene Butadiene methyl Styrene, HmSEBmS) and tetraethyl orthosilicate (TEOS) followed by calcination in air at 600 °C, for optical anti-reflection films. By changing the relative weight of the triblock polymer to TEOS, the pore-to-pore distance in the mesoporous silica film can be controlled without significantly affecting the size of the mesopores, thus, enabling effective control of the refractive index and porosity of the films. In terms of optical properties, the transmittance of the fabricated mesoporous silica film is approximately 3.3% higher than that of the uncoated glass substrate in the wavelength range of 400 to 750 nm. This work reports the fabrication of mesoporous silica films with controllable wall thicknesses by spin coating of precursor solutions consisting of polystyrene-block-polybutadiene-block-polystyrene based triblock copolymers (Hydrogenated methyl Styrene Ethylene Butadiene methyl Styrene, HmSEBmS) and tetraethyl orthosilicate (TEOS) followed by calcination in air at 600 °C, for optical anti-reflection films. By changing the relative weight of the triblock polymer to TEOS, the pore-to-pore distance in the mesoporous silica film can be controlled without significantly affecting the size of the mesopores, thus, enabling effective control of the refractive index and porosity of the films. In terms of optical properties, the transmittance of the fabricated mesoporous silica film is approximately 3.3% higher than that of the uncoated glass substrate in the wavelength range of 400 to 750 nm. |
| Author | Islam, Md Tofazzal Tanabe, Hirofumi Fatehmulla, Amanullah Abdullah, Nawfel Matsuura, Mikiya Farooq, Wazirzada Aslam Kaneti, Yusuf Valentino Bando, Yoshio Konstantinov, Konstantin Hossain, Md Shahriar A Maekawa, Kazuhiko Yamauchi, Yusuke |
| Author_xml | – sequence: 1 givenname: Nawfel surname: Abdullah fullname: Abdullah, Nawfel organization: Australian Institute for Innovative Materials (AIIM), University of Wollongong, Squires Way, North Wollongong, NSW 2500, Australia – sequence: 2 givenname: Md Shahriar A surname: Hossain fullname: Hossain, Md Shahriar A organization: Australian Institute for Innovative Materials (AIIM), University of Wollongong, Squires Way, North Wollongong, NSW 2500, Australia – sequence: 3 givenname: Konstantin surname: Konstantinov fullname: Konstantinov, Konstantin organization: Australian Institute for Innovative Materials (AIIM), University of Wollongong, Squires Way, North Wollongong, NSW 2500, Australia – sequence: 4 givenname: Hirofumi surname: Tanabe fullname: Tanabe, Hirofumi organization: Kuraray Co., Ltd., 41 Miyukigaoka, Tsukuba, Ibaraki 305-0841, Japan – sequence: 5 givenname: Mikiya surname: Matsuura fullname: Matsuura, Mikiya organization: Kuraray Co., Ltd., 41 Miyukigaoka, Tsukuba, Ibaraki 305-0841, Japan – sequence: 6 givenname: Kazuhiko surname: Maekawa fullname: Maekawa, Kazuhiko organization: Kuraray Co., Ltd., 41 Miyukigaoka, Tsukuba, Ibaraki 305-0841, Japan – sequence: 7 givenname: Amanullah surname: Fatehmulla fullname: Fatehmulla, Amanullah organization: Department of Physics and Astronomy, College of Science, King Saudi University, Riyadh 11451, Saudi Arabia – sequence: 8 givenname: Wazirzada Aslam surname: Farooq fullname: Farooq, Wazirzada Aslam organization: Department of Physics and Astronomy, College of Science, King Saudi University, Riyadh 11451, Saudi Arabia – sequence: 9 givenname: Md Tofazzal surname: Islam fullname: Islam, Md Tofazzal organization: Department of Biotechnology, Bangabandhu Sheikh Mujibur Rahman Agricultural University, Gazipur 1706, Bangladesh – sequence: 10 givenname: Yoshio surname: Bando fullname: Bando, Yoshio organization: International Center for Materials Nanoarchitechtonics (MANA), National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan – sequence: 11 givenname: Yusuf Valentino surname: Kaneti fullname: Kaneti, Yusuf Valentino organization: International Center for Materials Nanoarchitechtonics (MANA), National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan – sequence: 12 givenname: Yusuke surname: Yamauchi fullname: Yamauchi, Yusuke organization: Australian Institute for Innovative Materials (AIIM), University of Wollongong, Squires Way, North Wollongong, NSW 2500, Australia |
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| Title | Tuning Wall Thicknesses in Mesoporous Silica Films for Optimization of Optical Anti-Reflective Properties |
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