Highly Plasmonic Titanium Nitride by Room-Temperature Sputtering

Titanium nitride (TiN) has recently emerged as an attractive alternative material for plasmonics. However, the typical high-temperature deposition of plasmonic TiN using either sputtering or atomic layer deposition has greatly limited its potential applications and prevented its integration into exi...

Full description

Saved in:

Bibliographic Details
Published in:	Scientific reports Vol. 9; no. 1; pp. 15287 - 9
Main Authors:	Chang, Chun-Chieh, Nogan, John, Yang, Zu-Po, Kort-Kamp, Wilton J. M., Ross, Willard, Luk, Ting S., Dalvit, Diego A. R., Azad, Abul K., Chen, Hou-Tong
Format:	Journal Article
Language:	English
Published:	London Nature Publishing Group UK 25.10.2019 Nature Publishing Group
Subjects:	639/624/399 639/925/927/1021 Bias CMOS Energy Sciences Fabrication Gold High temperature Humanities and Social Sciences Laboratories Material Science MATERIALS SCIENCE multidisciplinary Nanophotonics and plasmonics Optical materials and structures Optical properties Plasma Science Science (multidisciplinary) Temperature effects Thin films Titanium
ISSN:	2045-2322, 2045-2322
Online Access:	Get full text
Tags:	Add Tag No Tags, Be the first to tag this record!

Be the first to leave a comment!