Chang, C., Nogan, J., Yang, Z., Kort-Kamp, W. J. M., Ross, W., Luk, T. S., . . . Chen, H. (2019). Highly Plasmonic Titanium Nitride by Room-Temperature Sputtering. Scientific reports, 9(1), 15287-9. https://doi.org/10.1038/s41598-019-51236-3
Citácia podle Chicago (17th ed.)Chang, Chun-Chieh, John Nogan, Zu-Po Yang, Wilton J. M. Kort-Kamp, Willard Ross, Ting S. Luk, Diego A. R. Dalvit, Abul K. Azad, a Hou-Tong Chen. "Highly Plasmonic Titanium Nitride by Room-Temperature Sputtering." Scientific Reports 9, no. 1 (2019): 15287-9. https://doi.org/10.1038/s41598-019-51236-3.
Citácia podľa MLA (8th ed.)Chang, Chun-Chieh, et al. "Highly Plasmonic Titanium Nitride by Room-Temperature Sputtering." Scientific Reports, vol. 9, no. 1, 2019, pp. 15287-9, https://doi.org/10.1038/s41598-019-51236-3.