Influence of Al Content on the Properties of MgO Grown by Reactive Magnetron Sputtering

In the present work, reactive magnetron sputtering in DC mode was used to grow complex oxide thin films, starting from two separate pure metal targets. A series of coatings was produced with a stoichiometry of the film ranging from MgO, over MgxAlyOz to Al2O3. The surface energy, crystallinity, hard...

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Vydáno v:	Plasma processes and polymers Ročník 6; číslo S1; s. S751 - S754
Hlavní autoři:	Saraiva, Marta, Chen, Hong, Leroy, Wouter P., Mahieu, Stijn, Jehanathan, Neerushana, Lebedev, Oleg, Georgieva, Violeta, Persoons, Rosita, Depla, Diederik
Médium:	Journal Article
Jazyk:	angličtina
Vydáno:	Weinheim WILEY-VCH Verlag 01.06.2009 WILEY‐VCH Verlag
Témata:	Aluminum oxide Crystallinity Magnesium Magnesium oxide Magnetron sputtering Oxides sputtering Stoichiometry surface energy Surface roughness thin films X-ray
ISSN:	1612-8850, 1612-8869
On-line přístup:	Získat plný text
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