Tunable holographic metasurfaces for augmented and virtual reality

Augmented and virtual reality (AR/VR) is transforming how humans interact with technology in a wide range of fields and industries, from healthcare and education to entertainment. However, current device limitations have impeded wider integration. Tunable holographic metasurfaces represent a promisi...

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Bibliographic Details
Published in:Nanophotonics (Berlin, Germany) Vol. 14; no. 23; pp. 3813 - 3823
Main Authors: Aththanayake, Akeshi, Lininger, Andrew, Strangi, Cataldo, Griswold, Mark A., Strangi, Giuseppe
Format: Journal Article
Language:English
Published: Germany De Gruyter 15.11.2025
Walter de Gruyter GmbH
Subjects:
Augmented reality
Education
Headsets
Holography
Light
Liquid crystals
Machine learning
Metamaterials
metasurface
Metasurfaces
Nanostructured materials
Optics
Optimization techniques
Technology
Three dimensional imaging
tunable metasurface
Two dimensional materials
Virtual reality
augmented reality
metamaterials
virtual reality
tunable metasurface
metasurface
ISSN:2192-8614, 2192-8606, 2192-8614
Online Access:Get full text
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Summary:Augmented and virtual reality (AR/VR) is transforming how humans interact with technology in a wide range of fields and industries, from healthcare and education to entertainment. However, current device limitations have impeded wider integration. Tunable holographic metasurfaces represent a promising platform for revolutionizing AR/VR devices by precisely controlling light at the subwavelength scale. This article examines current challenges and opportunities from both the AR/VR and holographic metamaterial perspectives and explores how improvements to state-of-the-art approaches can address these challenges. In particular, we propose a focus on easily manufacturable and broadly electrically tunable metasurface technologies including liquid crystal integration and excitonic tuning in 2D materials. Advanced metasurface optimization techniques including machine learning will also be crucial for exploring the large design space.
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ISSN:2192-8614
2192-8606
2192-8614
DOI:10.1515/nanoph-2024-0734