Illuminating nonlinear dependence of film deposition rate in a CVD reactor on operating conditions

[Display omitted] ► Illumination of nonlinear dependence, through variation of operating parameters, of film deposition rate on prevailing flow patterns in a steady-state CVD reactor. ► Case study: silicon deposition. ► Nonlinearities captured by linking the recursive projection method (RPM) with co...

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Vydané v:	Chemical engineering journal (Lausanne, Switzerland : 1996) Ročník 181-182; s. 516 - 523
Hlavní autori:	Cheimarios, N., Koronaki, E.D., Boudouvis, A.G.
Médium:	Journal Article
Jazyk:	English
Vydavateľské údaje:	Elsevier B.V 01.02.2012
Predmet:	algorithms Arrhenius plot case studies chemical engineering Chemical vapor deposition chemistry Computational fluid dynamics equations Mixed convection flows Nonlinear phenomena Recursive projection method (RPM) silicon temperature Nonlinear phenomena Mixed convection flows Computational fluid dynamics Chemical vapor deposition Arrhenius plot Recursive projection method (RPM)
ISSN:	1385-8947, 1873-3212
On-line prístup:	Získať plný text
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