Optimized rapid thermal process for high efficiency silicon solar cells
Rapid thermal processing is opening new possibilities for a low-cost and environmentally safe silicon solar cell production, keeping the process time at high temperature in the order of 1 min, due to enhanced diffusion and oxidation mechanisms. Controlling the surface concentration of the junction i...
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| Published in: | Solar energy materials and solar cells Vol. 65; no. 1; pp. 495 - 501 |
|---|---|
| Main Authors: | , , , , , |
| Format: | Journal Article Conference Proceeding |
| Language: | English |
| Published: |
Amsterdam
Elsevier B.V
2001
Elsevier |
| Subjects: | |
| ISSN: | 0927-0248, 1879-3398 |
| Online Access: | Get full text |
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| Abstract | Rapid thermal processing is opening new possibilities for a low-cost and environmentally safe silicon solar cell production, keeping the process time at high temperature in the order of 1
min, due to enhanced diffusion and oxidation mechanisms. Controlling the surface concentration of the junction is one of the major parameters, in order to obtain suitable front surface recombination velocities. Simultaneous diffusion of phosphorus and aluminum is used to realize emitter and back surface field in a single high-temperature step, with optimized gettering effect. Controlling the mentioned parameters on industrial 1
Ω
cm Cz material lead in 17.5% efficient solar cells on a surface of 25
cm
2. All results are discussed in terms of process temperature, dopant source concentration and effective process time, below 1
min including high heating and cooling rates. |
|---|---|
| AbstractList | Rapid thermal processing is opening new possibilities for a low-cost and environmentally safe silicon solar cell production, keeping the process time at high temperature in the order of 1 min, due to enhanced diffusion and oxidation mechanisms. Controlling the surface concentration of the junction is one of the major parameters, in order to obtain suitable front surface recombination velocities. Simultaneous diffusion of phosphorus and aluminum is used to realize emitter and back surface field in a single high-temperature step, with optimized gettering effect. Controlling the mentioned parameters on industrial 1 Omega cm Cz material lead in 17.5% efficient solar cells on a surface of 25 cm super(2). All results are discussed in terms of process temperature, dopant source concentration and effective process time, below 1 min including high heating and cooling rates. Rapid thermal processing is opening new possibilities for a low-cost and environmentally safe silicon solar cell production, keeping the process time at high temperature in the order of 1 min, due to enhanced diffusion and oxidation mechanisms. Controlling the surface concentration of the junction is one of the major parameters, in order to obtain suitable front surface recombination velocities. Simultaneous diffusion of phosphorus and aluminum is used to realize emitter and back surface field in a single high-temperature step, with optimized gettering effect. Controlling the mentioned parameters on industrial 1 Ω cm Cz material lead in 17.5% efficient solar cells on a surface of 25 cm 2. All results are discussed in terms of process temperature, dopant source concentration and effective process time, below 1 min including high heating and cooling rates. |
| Author | Peters, S Lautenschlager, H Slaoui, A Noël, S Schindler, R Muller, J.C |
| Author_xml | – sequence: 1 givenname: S surname: Noël fullname: Noël, S email: noel@phase.c-strasbourg.fr organization: Laboratoire PHASE, 23, rue du Loess, 67037 Strasbourg, France – sequence: 2 givenname: A surname: Slaoui fullname: Slaoui, A organization: Laboratoire PHASE, 23, rue du Loess, 67037 Strasbourg, France – sequence: 3 givenname: S surname: Peters fullname: Peters, S organization: FhG ISE, Oltmannstr.5, 79100 Freiburg, Germany – sequence: 4 givenname: H surname: Lautenschlager fullname: Lautenschlager, H organization: FhG ISE, Oltmannstr.5, 79100 Freiburg, Germany – sequence: 5 givenname: R surname: Schindler fullname: Schindler, R organization: FhG ISE, Oltmannstr.5, 79100 Freiburg, Germany – sequence: 6 givenname: J.C surname: Muller fullname: Muller, J.C organization: Laboratoire PHASE, 23, rue du Loess, 67037 Strasbourg, France |
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| Cites_doi | 10.1109/T-ED.1984.21805 10.1109/T-ED.1979.19525 10.1109/T-ED.1986.22473 |
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| Keywords | Silicon solar cells Efficiency Rapid thermal processing Impurity density Doping Aluminium addition Phosphorus addition Optimization Surface Solar cell Rapid thermal annealing Quantum efficiency Surface recombination Charge carrier recombination Silicon Concentration distribution |
| Language | English |
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| References | Del Alamo, Swanson (BIB4) 1984; ED-31 P. Doshi, J. Moschner, J. Jeong, A. Rohatgi, R. Singh, S. Narayanan, Proceedings of the 26th IEEE PVSEC, 1997, p. 87. Shibib, Lindholm, Therez (BIB3) 1979; ED-26 A. Cuevas, P.A. Basore, G. Giroult-Matlakowski, C. Dubois, Proceedings of the 13th ECPVSEC, Nice, 1995. Park, Neugroschel, Lindholm (BIB2) 1986; ED-33 Del Alamo (10.1016/S0927-0248(00)00132-X_BIB4) 1984; ED-31 10.1016/S0927-0248(00)00132-X_BIB5 Shibib (10.1016/S0927-0248(00)00132-X_BIB3) 1979; ED-26 10.1016/S0927-0248(00)00132-X_BIB1 Park (10.1016/S0927-0248(00)00132-X_BIB2) 1986; ED-33 |
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| SubjectTerms | Applied sciences Efficiency Energy Exact sciences and technology Natural energy Photovoltaic conversion Rapid thermal processing Silicon solar cells Solar cells. Photoelectrochemical cells Solar energy |
| Title | Optimized rapid thermal process for high efficiency silicon solar cells |
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