Physics and technology of magnetron sputtering discharges
Magnetron sputtering deposition has become the most widely used technique for deposition of both metallic and compound thin films and is utilized in numerous industrial applications. There has been a continuous development of the magnetron sputtering technology to improve target utilization, increas...
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| Published in: | Plasma sources science & technology Vol. 29; no. 11 |
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| Main Author: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
IOP Publishing
01.11.2020
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| Subjects: | |
| ISSN: | 0963-0252, 1361-6595 |
| Online Access: | Get full text |
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