Energy flux measurements during magnetron sputter deposition processes

The influence of energetic species on thin film growth mechanism is a long-term issue in the field of low-pressure plasma-based magnetron sputtering technology. Several species may contribute to the energy flux such a plasma ions, electrons and neutrals, film-forming species, photons, etc. Several r...

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Vydané v:	Surface & coatings technology Ročník 377; s. 124887
Hlavní autori:	Thomann, A.-L., Caillard, A., Raza, M., El Mokh, M., Cormier, P.A., Konstantinidis, S.
Médium:	Journal Article
Jazyk:	English
Vydavateľské údaje:	Lausanne Elsevier B.V 15.11.2019 Elsevier BV Elsevier
Predmet:	Chemical reactions Crystalline phase formation Energy Energy flux Engineering Sciences Film growth Fluxes Low pressure Magnetron sputtering Materials Organic chemistry Oxidation Parameter identification Phase composition Plasma diagnostics Plasmas Sputtering process Thermopiles Thin film deposition Thin films Zirconium dioxide Magnetron sputtering Sputtering process Energy flux Thin film deposition Crystalline phase formation sputtering process crystalline phase formation thin film deposition energy flux
ISSN:	0257-8972, 1879-3347
On-line prístup:	Získať plný text
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