Energy flux measurements during magnetron sputter deposition processes

The influence of energetic species on thin film growth mechanism is a long-term issue in the field of low-pressure plasma-based magnetron sputtering technology. Several species may contribute to the energy flux such a plasma ions, electrons and neutrals, film-forming species, photons, etc. Several r...

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Vydáno v:	Surface & coatings technology Ročník 377; s. 124887
Hlavní autoři:	Thomann, A.-L., Caillard, A., Raza, M., El Mokh, M., Cormier, P.A., Konstantinidis, S.
Médium:	Journal Article
Jazyk:	angličtina
Vydáno:	Lausanne Elsevier B.V 15.11.2019 Elsevier BV Elsevier
Témata:	Chemical reactions Crystalline phase formation Energy Energy flux Engineering Sciences Film growth Fluxes Low pressure Magnetron sputtering Materials Organic chemistry Oxidation Parameter identification Phase composition Plasma diagnostics Plasmas Sputtering process Thermopiles Thin film deposition Thin films Zirconium dioxide Magnetron sputtering Sputtering process Energy flux Thin film deposition Crystalline phase formation sputtering process crystalline phase formation thin film deposition energy flux
ISSN:	0257-8972, 1879-3347
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Abstract	The influence of energetic species on thin film growth mechanism is a long-term issue in the field of low-pressure plasma-based magnetron sputtering technology. Several species may contribute to the energy flux such a plasma ions, electrons and neutrals, film-forming species, photons, etc. Several research groups have designed probes capable of quantifying energy fluxes in these particular working conditions and experimental strategies to get a better insight on the relationship between the plasma working parameters, the energy flux, the film growth mechanism and the coating properties. In this paper we aim at showing how the thermopile-based probe developed at GREMI laboratory can contribute to this field thanks to its time resolved capability (~ms) and sensitivity (~mW/cm2). We show how such a probe can be used to identify and quantify energetic contributions such as gas conduction, chemical reactions on surfaces such as oxidation, but also radiations emitted from a (hot) sputter target during DC, pulsed-DC and High-power Impulse Magnetron Sputtering (HiPIMS) processes. Both non-reactive and reactive sputtering discharges are studied. Ultimately, we present data on the relationship between the phase composition and the energy deposited during the synthesis of two technologically important thin film materials, namely Titania and Zirconia. Through the reported examples, the advantage and limitations of energy flux measurements and the interest to couple the obtained data to those derived from conventional plasma diagnostics are discussed. The relative importance of various energetic contributions is investigated in a purpose to identify the key parameters driving the film properties. •Energy transferred to the film during deposition can be quantified.•The deposited energy at the substrate is the sum of elementary contributions.•Direct energy flux measurements allow investigating the sputter/deposition process.•IR radiations emitted by the heated target play a role on thin film final properties.•Energy deposited during deposition may hinder thermodynamic stabilization of phases.
AbstractList	The influence of energetic species on thin film growth mechanism is a long-term issue in the field of low-pressure plasma-based magnetron sputtering technology. Several species may contribute to the energy flux such a plasma ions, electrons and neutrals, film-forming species, photons, etc. Several research groups have designed probes capable of quantifying energy fluxes in these particular working conditions and experimental strategies to get a better insight on the relationship between the plasma working parameters, the energy flux, the film growth mechanism and the coating properties. In this paper we aim at showing how the thermopile-based probe developed at GREMI laboratory can contribute to this field thanks to its time resolved capability (~ms) and sensitivity (~mW/cm2). We show how such a probe can be used to identify and quantify energetic contributions such as gas conduction, chemical reactions on surfaces such as oxidation, but also radiations emitted from a (hot) sputter target during DC, pulsed-DC and High-power Impulse Magnetron Sputtering (HiPIMS) processes. Both non-reactive and reactive sputtering discharges are studied. Ultimately, we present data on the relationship between the phase composition and the energy deposited during the synthesis of two technologically important thin film materials, namely Titania and Zirconia. Through the reported examples, the advantage and limitations of energy flux measurements and the interest to couple the obtained data to those derived from conventional plasma diagnostics are discussed. The relative importance of various energetic contributions is investigated in a purpose to identify the key parameters driving the film properties. The influence of energetic species on thin film growth mechanism is a long-term issue in the field of low-pressure plasma-based magnetron sputtering technology. Several species may contribute to the energy flux such a plasma ions, electrons and neutrals, film-forming species, photons, etc. Several research groups have designed probes capable of quantifying energy fluxes in these particular working conditions and experimental strategies to get a better insight on the relationship between the plasma working parameters, the energy flux, the film growth mechanism and the coating properties. In this paper we aim at showing how the thermopile-based probe developed at GREMI laboratory can contribute to this field thanks to its time resolved capability (~ms) and sensitivity (~mW/cm2). We show how such a probe can be used to identify and quantify energetic contributions such as gas conduction, chemical reactions on surfaces such as oxidation, but also radiations emitted from a (hot) sputter target during DC, pulsed-DC and High-power Impulse Magnetron Sputtering (HiPIMS) processes. Both non-reactive and reactive sputtering discharges are studied. Ultimately, we present data on the relationship between the phase composition and the energy deposited during the synthesis of two technologically important thin film materials, namely Titania and Zirconia. Through the reported examples, the advantage and limitations of energy flux measurements and the interest to couple the obtained data to those derived from conventional plasma diagnostics are discussed. The relative importance of various energetic contributions is investigated in a purpose to identify the key parameters driving the film properties. •Energy transferred to the film during deposition can be quantified.•The deposited energy at the substrate is the sum of elementary contributions.•Direct energy flux measurements allow investigating the sputter/deposition process.•IR radiations emitted by the heated target play a role on thin film final properties.•Energy deposited during deposition may hinder thermodynamic stabilization of phases. The influence of energetic species on thin film growth mechanism is a long-term issue in the field of low-pressure plasma-based magnetron sputtering technology. Several species may contribute to the energy flux such a plasma ions, electrons and neutrals, film-forming species, photons, etc. Several research groups have designed probes capable of quantifying energy fluxes in these particular working conditions and experimental strategies to get a better insight on the relationship between the plasma working parameters, the energy flux, the film growth mechanism and the coating properties. In this paper we aim at showing how the thermopilebased probe developed at GREMI laboratory can contribute to this field thanks to its time resolved capability (~ms) and sensitivity (~mW/cm 2). We show how such a probe can be used to identify and quantify energetic contributions such as gas conduction, chemical reactions on surfaces such as oxidation, but also radiations emitted from a (hot) sputter target during DC,
ArticleNumber	124887
Author	Konstantinidis, S. Thomann, A.-L. Caillard, A. Cormier, P.A. Raza, M. El Mokh, M.
Author_xml	– sequence: 1 givenname: A.-L. surname: Thomann fullname: Thomann, A.-L. email: anne-lise.thomann@univ-orleans.fr organization: Groupe de Recherches sur l'Energétique des Milieux Ionisés (GREMI), UMR7344 Université d'Orléans – CNRS BP6744, F-45067 Orléans Cedex 2, France – sequence: 2 givenname: A. surname: Caillard fullname: Caillard, A. organization: Groupe de Recherches sur l'Energétique des Milieux Ionisés (GREMI), UMR7344 Université d'Orléans – CNRS BP6744, F-45067 Orléans Cedex 2, France – sequence: 3 givenname: M. surname: Raza fullname: Raza, M. organization: Chimie des Interactions Plasma-Surface (ChIPS), Université de Mons, Avenue Copernic 3, 7000 Mons, Belgium – sequence: 4 givenname: M. surname: El Mokh fullname: El Mokh, M. organization: Groupe de Recherches sur l'Energétique des Milieux Ionisés (GREMI), UMR7344 Université d'Orléans – CNRS BP6744, F-45067 Orléans Cedex 2, France – sequence: 5 givenname: P.A. surname: Cormier fullname: Cormier, P.A. organization: Groupe de Recherches sur l'Energétique des Milieux Ionisés (GREMI), UMR7344 Université d'Orléans – CNRS BP6744, F-45067 Orléans Cedex 2, France – sequence: 6 givenname: S. surname: Konstantinidis fullname: Konstantinidis, S. organization: Chimie des Interactions Plasma-Surface (ChIPS), Université de Mons, Avenue Copernic 3, 7000 Mons, Belgium
BackLink	https://hal.science/hal-02381748$$DView record in HAL
BookMark	eNqFkE9LAzEUxINUsFW_gix48rBr_mw3WfBgKa0VCl70HNLkbU1pk5pki357U6oXL54eDPMb5s0IDZx3gNANwRXBpLnfVLEPnfYqVRSTtsKiyvIZGhLB25Kxmg_QENMxL0XL6QUaxbjBGBPe1kM0nzkI66-i2_afxQ5UjoIduBQL0wfr1sVOrR2k4F0R931KEAoDex9tslnaB68hRohX6LxT2wjXP_cSvc1nr9NFuXx5ep5OlqWuKU3livIxxg2BVYcFqcemNYQaPOYNMMFa2rDWCFgZypqarbRSogZDNdcaGoGJYZfo7pT7rrZyH-xOhS_plZWLyVIeNUyZILwWB5K9tydvbvnRQ0xy4_vgcj1JGaGUCkZ4dj2cXDr4GAN0Utukjt-loOxWEiyPK8uN_F1ZHleWWMgsZ7z5g_-2-hd8PIGQ5zpYCDJqC06DsQF0ksbb_yK-AeZ9new
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ContentType	Journal Article
Copyright	2019 Elsevier B.V. Copyright Elsevier BV Nov 15, 2019 Distributed under a Creative Commons Attribution 4.0 International License
Copyright_xml	– notice: 2019 Elsevier B.V. – notice: Copyright Elsevier BV Nov 15, 2019 – notice: Distributed under a Creative Commons Attribution 4.0 International License
DBID	AAYXX CITATION 7QQ 7SR 8BQ 8FD JG9 1XC VOOES
DOI	10.1016/j.surfcoat.2019.08.016
DatabaseName	CrossRef Ceramic Abstracts Engineered Materials Abstracts METADEX Technology Research Database Materials Research Database Hyper Article en Ligne (HAL) Hyper Article en Ligne (HAL) (Open Access)
DatabaseTitle	CrossRef Materials Research Database Engineered Materials Abstracts Ceramic Abstracts Technology Research Database METADEX
DatabaseTitleList	Materials Research Database
DeliveryMethod	fulltext_linktorsrc
Discipline	Engineering Chemistry
EISSN	1879-3347
ExternalDocumentID	oai:HAL:hal-02381748v1 10_1016_j_surfcoat_2019_08_016 S025789721930859X
GroupedDBID	--K --M .~1 0R~ 123 1B1 1RT 1~. 1~5 4.4 457 4G. 5VS 7-5 71M 8P~ 9JN AABNK AABXZ AACTN AAEDT AAEDW AAEPC AAIAV AAIKJ AAKOC AALRI AAOAW AAQFI AAXUO ABFNM ABFRF ABMAC ABNEU ABXRA ABYKQ ACDAQ ACFVG ACGFS ACIWK ACRLP ADBBV ADEZE AEBSH AEFWE AEKER AENEX AEZYN AFKWA AFRZQ AFTJW AGUBO AGYEJ AHHHB AIEXJ AIKHN AITUG AIVDX AJOXV ALMA_UNASSIGNED_HOLDINGS AMFUW AMRAJ AXJTR BKOJK BLXMC CS3 DU5 EBS EFJIC EFLBG EJD EO8 EO9 EP2 EP3 FDB FIRID FNPLU FYGXN G-Q GBLVA IHE J1W KOM M24 M38 M41 MAGPM MO0 N9A O-L O9- OAUVE OGIMB OZT P-8 P-9 P2P PC. Q38 RIG RNS ROL RPZ SDF SDG SDP SES SPC SPCBC SPD SSM SSQ SSZ T5K XPP ZMT ~02 ~G- 29Q 9DU AAQXK AATTM AAXKI AAYWO AAYXX ABJNI ABWVN ABXDB ACLOT ACNNM ACRPL ACVFH ADCNI ADMUD ADNMO AEIPS AEUPX AFJKZ AFPUW AGHFR AGQPQ AIGII AIIUN AKBMS AKRWK AKYEP ANKPU APXCP ASPBG AVWKF AZFZN BBWZM CITATION EFKBS FEDTE FGOYB G-2 HMV HVGLF HX~ HZ~ NDZJH R2- SEW SMS SPG WUQ ~HD 7QQ 7SR 8BQ 8FD AFXIZ AGCQF AGRNS JG9 SSH 1XC VOOES
ID	FETCH-LOGICAL-c422t-b2750061ebf08145d9d12d0576e38392639d8ebd23643bcaa84ed2c7cce6801d3
ISICitedReferencesCount	41
ISICitedReferencesURI	http://www.webofscience.com/api/gateway?GWVersion=2&SrcApp=Summon&SrcAuth=ProQuest&DestLinkType=CitingArticles&DestApp=WOS_CPL&KeyUT=000488417800034&url=https%3A%2F%2Fcvtisr.summon.serialssolutions.com%2F%23%21%2Fsearch%3Fho%3Df%26include.ft.matches%3Dt%26l%3Dnull%26q%3D
ISSN	0257-8972
IngestDate	Tue Oct 14 21:00:55 EDT 2025 Fri Jul 25 05:16:21 EDT 2025 Sat Nov 29 07:18:39 EST 2025 Tue Nov 18 19:39:42 EST 2025 Fri Feb 23 02:30:26 EST 2024
IsDoiOpenAccess	true
IsOpenAccess	true
IsPeerReviewed	true
IsScholarly	true
Keywords	Magnetron sputtering Sputtering process Energy flux Thin film deposition Crystalline phase formation sputtering process crystalline phase formation thin film deposition energy flux
Language	English
License	Distributed under a Creative Commons Attribution 4.0 International License: http://creativecommons.org/licenses/by/4.0
LinkModel	OpenURL
MergedId	FETCHMERGED-LOGICAL-c422t-b2750061ebf08145d9d12d0576e38392639d8ebd23643bcaa84ed2c7cce6801d3
Notes	ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 14
ORCID	0000-0002-0701-3571 0000-0001-9540-1381
OpenAccessLink	https://hal.science/hal-02381748
PQID	2312228317
PQPubID	2045394
ParticipantIDs	hal_primary_oai_HAL_hal_02381748v1 proquest_journals_2312228317 crossref_citationtrail_10_1016_j_surfcoat_2019_08_016 crossref_primary_10_1016_j_surfcoat_2019_08_016 elsevier_sciencedirect_doi_10_1016_j_surfcoat_2019_08_016
PublicationCentury	2000
PublicationDate	2019-11-15
PublicationDateYYYYMMDD	2019-11-15
PublicationDate_xml	– month: 11 year: 2019 text: 2019-11-15 day: 15
PublicationDecade	2010
PublicationPlace	Lausanne
PublicationPlace_xml	– name: Lausanne
PublicationTitle	Surface & coatings technology
PublicationYear	2019
Publisher	Elsevier B.V Elsevier BV Elsevier
Publisher_xml	– name: Elsevier B.V – name: Elsevier BV – name: Elsevier
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SSID	ssj0001794
Score	2.490812
SecondaryResourceType	review_article
Snippet	The influence of energetic species on thin film growth mechanism is a long-term issue in the field of low-pressure plasma-based magnetron sputtering...
SourceID	hal proquest crossref elsevier
SourceType	Open Access Repository Aggregation Database Enrichment Source Index Database Publisher
StartPage	124887
SubjectTerms	Chemical reactions Crystalline phase formation Energy Energy flux Engineering Sciences Film growth Fluxes Low pressure Magnetron sputtering Materials Organic chemistry Oxidation Parameter identification Phase composition Plasma diagnostics Plasmas Sputtering process Thermopiles Thin film deposition Thin films Zirconium dioxide
Title	Energy flux measurements during magnetron sputter deposition processes
URI	https://dx.doi.org/10.1016/j.surfcoat.2019.08.016 https://www.proquest.com/docview/2312228317 https://hal.science/hal-02381748
Volume	377
WOSCitedRecordID	wos000488417800034&url=https%3A%2F%2Fcvtisr.summon.serialssolutions.com%2F%23%21%2Fsearch%3Fho%3Df%26include.ft.matches%3Dt%26l%3Dnull%26q%3D
hasFullText	1
inHoldings	1
isFullTextHit
isPrint
journalDatabaseRights	– providerCode: PRVESC databaseName: Elsevier SD Freedom Collection Journals 2021 customDbUrl: eissn: 1879-3347 dateEnd: 99991231 omitProxy: false ssIdentifier: ssj0001794 issn: 0257-8972 databaseCode: AIEXJ dateStart: 19950101 isFulltext: true titleUrlDefault: https://www.sciencedirect.com providerName: Elsevier
link	http://cvtisr.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwtV3db9MwELfYhsR4QDBAKwxkId6qjOajcfwYTZ0GKhNCA_XNSmyHUbqsarKp4q_nznbcsg3GHniJqpPsJr1f7n6-3gchb2VcqKpUYP1UKIOExWnAWZUECntRgQeqKtOB7-uYHR9nkwn_5FKCGjNOgNV1tlzy-X9VNchA2Vg6ewd1-01BAJ9B6XAFtcP1nxQ_stV81exi2T9bRQCbriLxrPhWawyA95u5mVKN2bAudas_t3UDLrFw2lWLLKpCaoMSeV60ZtJney0mb3KNLB3O94Px_urvDZxsZFPocy_9XPw0vPWjl4xmYGF-nK4JXTQi5FiWZ-sxndECExBknP1mYWM3qcXaSGAUmXWy18y3jSRMwW8sKnweTL3jpsVqeEO_7Ct-zGcXdolrU9HtI3AfgfM2w3SDbEVsyMECbuXvR5MP3m-jaTIROfcEa_XkN9_Rn6jMxinm1F5x7YavnDwmj9xBg-YWIE_IPV3vkAcH3Xy_HfJwrRXlU3JoYUMRNnQdNtTChnrYUAcbuoIN9bB5Rr4cjk4OjgI3YyOQSRS1QYn9_YHT6bKCVzMZKq7CSAGJT3WM3BkIrMp0qXDOQFzKosgSrSLJpNQpkBsVPyeb9XmtdwkNdRZnSTjQ2MRNDnjJy5SxQQmL4RhXxD0y7H4uIV0DepyDMhN_V1iPvPPr5rYFy60reKcN4YikJYgCgHbr2jegPv9F2H39KB8LlBl6y5LsMuyRvU67wr36jYCTEoZTgZC_uPMdvyTbq7dpj2y2iwv9ityXl-33ZvHaIfUXWAiuAw
linkProvider	Elsevier
openUrl	ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Energy+flux+measurements+during+magnetron+sputter+deposition+processes&rft.jtitle=Surface+%26+coatings+technology&rft.au=Thomann%2C+A.-L.&rft.au=Caillard%2C+A.&rft.au=Raza%2C+M.&rft.au=El+Mokh%2C+M.&rft.date=2019-11-15&rft.issn=0257-8972&rft.volume=377&rft.spage=124887&rft_id=info:doi/10.1016%2Fj.surfcoat.2019.08.016&rft.externalDBID=n%2Fa&rft.externalDocID=10_1016_j_surfcoat_2019_08_016
thumbnail_l	http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0257-8972&client=summon
thumbnail_m	http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0257-8972&client=summon
thumbnail_s	http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0257-8972&client=summon