Park, S., Kyung, Y., Lee, J., Jang, Y., Cha, T., Noh, Y., . . . Kim, G. (2019). Cause analysis of the faults in HARC etching processes by using the PI‐VM model for OLED display manufacturing. Plasma processes and polymers, 16(9), -n/a. https://doi.org/10.1002/ppap.201900030
Citácia podle Chicago (17th ed.)Park, Seolhye, et al. "Cause Analysis of the Faults in HARC Etching Processes by Using the PI‐VM Model for OLED Display Manufacturing." Plasma Processes and Polymers 16, no. 9 (2019): -n/a. https://doi.org/10.1002/ppap.201900030.
Citácia podľa MLA (8th ed.)Park, Seolhye, et al. "Cause Analysis of the Faults in HARC Etching Processes by Using the PI‐VM Model for OLED Display Manufacturing." Plasma Processes and Polymers, vol. 16, no. 9, 2019, pp. -n/a, https://doi.org/10.1002/ppap.201900030.