APA (7th ed.) Citation

Park, S., Kyung, Y., Lee, J., Jang, Y., Cha, T., Noh, Y., . . . Kim, G. (2019). Cause analysis of the faults in HARC etching processes by using the PI‐VM model for OLED display manufacturing. Plasma processes and polymers, 16(9), -n/a. https://doi.org/10.1002/ppap.201900030

Chicago Style (17th ed.) Citation

Park, Seolhye, et al. "Cause Analysis of the Faults in HARC Etching Processes by Using the PI‐VM Model for OLED Display Manufacturing." Plasma Processes and Polymers 16, no. 9 (2019): -n/a. https://doi.org/10.1002/ppap.201900030.

MLA (9th ed.) Citation

Park, Seolhye, et al. "Cause Analysis of the Faults in HARC Etching Processes by Using the PI‐VM Model for OLED Display Manufacturing." Plasma Processes and Polymers, vol. 16, no. 9, 2019, pp. -n/a, https://doi.org/10.1002/ppap.201900030.