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Citace podle MLA (9th ed.)Park, Seolhye, et al. "Cause Analysis of the Faults in HARC Etching Processes by Using the PI‐VM Model for OLED Display Manufacturing." Plasma Processes and Polymers, vol. 16, no. 9, 2019, pp. -n/a, https://doi.org/10.1002/ppap.201900030.