Factors influencing ion energy distributions in pulsed inductively coupled argon plasmas

Pulsed plasmas are important for the fabrication of nanoscale features. Source biasing is generally associated with the control of the ion to radical flux ratio; how the ion energy distribution function varies over a pulse period is also important. In this paper, we experimentally investigate the ef...

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Vydané v:	Journal of physics. D, Applied physics Ročník 53; číslo 33
Hlavní autori:	Chen, Zhiying, Longo, Roberto C, Hummel, Michael, Carruth, Megan, Blakeney, Joel, Ventzek, Peter, Ranjan, Alok
Médium:	Journal Article
Jazyk:	English
Vydavateľské údaje:	IOP Publishing 12.08.2020
Predmet:	fluid plasma simulation ion energy distribution pulse transient pulsed plasma
ISSN:	0022-3727, 1361-6463
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