XPS investigation of monatomic and cluster argon ion sputtering of tantalum pentoxide

•Ion beam induced oxide reduction from monatomic and gas cluster ion beam exposure are compared.•Lower relative level of preferential sputtering is shown in gas cluster ion beam depth profiling.•A lack of “steady state” is observed in gas cluster ion beam depth profiles of tantalum pentoxide.•Possib...

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Bibliographic Details

Published in:	Applied surface science Vol. 405; pp. 79 - 87
Main Authors:	Simpson, Robin, White, Richard G., Watts, John F., Baker, Mark A.
Format:	Journal Article
Language:	English
Published:	Elsevier B.V 31.05.2017
Subjects:	Cluster Ion beam Oxide Sputtering Ta2O5 XPS Oxide Ion beam Cluster XPS Sputtering Ta2O5
ISSN:	0169-4332, 1873-5584
Online Access:	Get full text
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