XPS investigation of monatomic and cluster argon ion sputtering of tantalum pentoxide
•Ion beam induced oxide reduction from monatomic and gas cluster ion beam exposure are compared.•Lower relative level of preferential sputtering is shown in gas cluster ion beam depth profiling.•A lack of “steady state” is observed in gas cluster ion beam depth profiles of tantalum pentoxide.•Possib...
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| Vydáno v: | Applied surface science Ročník 405; s. 79 - 87 |
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| Hlavní autoři: | , , , |
| Médium: | Journal Article |
| Jazyk: | angličtina |
| Vydáno: |
Elsevier B.V
31.05.2017
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| Témata: | |
| ISSN: | 0169-4332, 1873-5584 |
| On-line přístup: | Získat plný text |
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| Abstract | •Ion beam induced oxide reduction from monatomic and gas cluster ion beam exposure are compared.•Lower relative level of preferential sputtering is shown in gas cluster ion beam depth profiling.•A lack of “steady state” is observed in gas cluster ion beam depth profiles of tantalum pentoxide.•Possible mechanisms behind the observed results, including temperature effects are proposed.
In recent years, gas cluster ion beams (GCIB) have become the cutting edge of ion beam technology to sputter etch organic materials in surface analysis. However, little is currently known on the ability of argon cluster ions (Arn+) to etch metal oxides and other technologically important inorganic compounds and no depth profiles have previously been reported. In this work, XPS depth profiles through a certified (European standard BCR-261T) 30nm thick Ta2O5 layer grown on Ta foil using monatomic Ar+ and Ar1000+ cluster ions have been performed at different incident energies. The preferential sputtering of oxygen induced using 6keV Ar1000+ ions is lower relative to 3keV and 500eV Ar+ ions. Ar+ ions exhibit a steady state O/Ta ratio through the bulk oxide but Ar1000+ ions show a gradual decrease in the O/Ta ratio as a function of depth. The depth resolution and etch rate is substantially better for the monatomic beam compared to the cluster beam. Higher O concentrations are observed when the underlying Ta bulk metal is sputtered for the Ar1000+ profiles compared to the Ar+ profiles. |
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| AbstractList | •Ion beam induced oxide reduction from monatomic and gas cluster ion beam exposure are compared.•Lower relative level of preferential sputtering is shown in gas cluster ion beam depth profiling.•A lack of “steady state” is observed in gas cluster ion beam depth profiles of tantalum pentoxide.•Possible mechanisms behind the observed results, including temperature effects are proposed.
In recent years, gas cluster ion beams (GCIB) have become the cutting edge of ion beam technology to sputter etch organic materials in surface analysis. However, little is currently known on the ability of argon cluster ions (Arn+) to etch metal oxides and other technologically important inorganic compounds and no depth profiles have previously been reported. In this work, XPS depth profiles through a certified (European standard BCR-261T) 30nm thick Ta2O5 layer grown on Ta foil using monatomic Ar+ and Ar1000+ cluster ions have been performed at different incident energies. The preferential sputtering of oxygen induced using 6keV Ar1000+ ions is lower relative to 3keV and 500eV Ar+ ions. Ar+ ions exhibit a steady state O/Ta ratio through the bulk oxide but Ar1000+ ions show a gradual decrease in the O/Ta ratio as a function of depth. The depth resolution and etch rate is substantially better for the monatomic beam compared to the cluster beam. Higher O concentrations are observed when the underlying Ta bulk metal is sputtered for the Ar1000+ profiles compared to the Ar+ profiles. |
| Author | Simpson, Robin Baker, Mark A. White, Richard G. Watts, John F. |
| Author_xml | – sequence: 1 givenname: Robin surname: Simpson fullname: Simpson, Robin email: r.simpson@surrey.ac.uk, robin.simpson@thermofisher.com organization: The Surface Analysis Laboratory, Department of Mechanical Engineering Sciences, University of Surrey, United Kingdom – sequence: 2 givenname: Richard G. surname: White fullname: White, Richard G. organization: Thermo Scientific, East Grinstead, United Kingdom – sequence: 3 givenname: John F. surname: Watts fullname: Watts, John F. organization: The Surface Analysis Laboratory, Department of Mechanical Engineering Sciences, University of Surrey, United Kingdom – sequence: 4 givenname: Mark A. surname: Baker fullname: Baker, Mark A. organization: The Surface Analysis Laboratory, Department of Mechanical Engineering Sciences, University of Surrey, United Kingdom |
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| Cites_doi | 10.1016/j.nimb.2009.06.019 10.1007/s00339-012-7007-2 10.1016/j.tsf.2015.11.017 10.1126/science.257.5068.355 10.1016/j.corsci.2015.06.019 10.1063/1.370817 10.1116/1.570088 10.1016/j.jlumin.2015.12.018 10.1116/1.3456123 10.1063/1.4892097 10.1016/0169-4332(86)90139-X 10.1016/S0169-4332(98)00796-X 10.1016/j.elspec.2010.02.006 10.1002/sia.5949 10.1002/mas.20233 10.1016/j.elspec.2008.10.004 10.1116/11.20140702 10.1016/S0168-583X(99)01163-5 10.1016/j.nimb.2009.01.056 10.1016/0168-583X(93)90755-U 10.1002/sia.740140505 10.1016/j.apsusc.2015.05.143 10.1149/1.2404041 10.1016/S0927-796X(97)00023-5 10.1116/11.20140701 10.1007/s13361-016-1401-5 |
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| References | Medicherla, Majumder, Paramanik, Varma (bib0045) 2010; 180 Klein (bib0160) 1972; 119 Musumeci, Ryuto, Sakata, Takeuchi, Takaoka (bib0125) 2016; 172 Ziegler (bib0100) 2013 Barlow, Portoles, Cumpson (bib0065) 2014; 116 Sano, Barlow, Tsakonas, Cranton, Cumpson (bib0070) 2016; 48 Grilli, Simpson, Mallinson, Baker (bib0090) 2014; 21 Cheng, Lee (bib0120) 2009; 267 Ezhilvalavan, Tseng (bib0010) 1999; 10 Huatala, Borland, Tabat, Skinner (bib0140) 2004 Chaneliere, Autran, Devine, Balland (bib0030) 1998; 22 Yamada, Matsuo, Insepov, Aoki, Seki, Toyoda (bib0110) 2000; 164–165 Seah, Havelund, Gilmore (bib0130) 2016; 27 U. Wätjen, M.P. Seah, S.J. Spencer, C. Ingelbrecht, The certification of a fourth batch of tantalum pentoxide on tantalum foil’ Report EUR 22610 EN, Office for Official Publications of the European Communities, Luxembourg, (2006). Baer, Engelhard, Lea, Nachimuthu (bib0055) 2010; 28 Kelly, Bertóti, Miotello (bib0150) 1993; 80/81 Zhang, Zheng, Cai, Lin, Wu, Mao, Zhang, Zhao, Chen (bib0015) 2012; 108 Malherbe, Odendaal (bib0105) 1999; 144–145 Wild (bib0025) 1989; 14 Mahoney (bib0135) 2010; 29 Benito, Palacio (bib0060) 2015; 351 Hofmann, Sanz (bib0035) 1982–1983; 1 Khanuja, Sharma, Mehta, Shivaprasad (bib0050) 2009; 169 Aoki, Seki, Matsuo (bib0095) 2009; 267 Malherbe, Hofmann, Sanz (bib0155) 1986; 27 Aureau, Ridier, Bérini, Dumont, Keller, Vigneron, Bouttemy, Etcheberry, Fouchet (bib0080) 2016; 601 P. Mack, unpublished work. Grilli, Simpson, Mallinson, Baker (bib0085) 2014; 21 Cleveland, Landman (bib0115) 1992; 257 Yamada (bib0145) 2015 Holloway, Nelson (bib0040) 1979; 16 Joshi, Cole (bib0005) 1999; 86 Steinberger, Walter, Greuntz, Arndt, Molodtsov, Meyer, Stifter (bib0075) 2015; 99 Khanuja (10.1016/j.apsusc.2017.02.006_bib0050) 2009; 169 Barlow (10.1016/j.apsusc.2017.02.006_bib0065) 2014; 116 10.1016/j.apsusc.2017.02.006_bib0165 10.1016/j.apsusc.2017.02.006_bib0020 Baer (10.1016/j.apsusc.2017.02.006_bib0055) 2010; 28 Medicherla (10.1016/j.apsusc.2017.02.006_bib0045) 2010; 180 Grilli (10.1016/j.apsusc.2017.02.006_bib0090) 2014; 21 Ezhilvalavan (10.1016/j.apsusc.2017.02.006_bib0010) 1999; 10 Holloway (10.1016/j.apsusc.2017.02.006_bib0040) 1979; 16 Kelly (10.1016/j.apsusc.2017.02.006_bib0150) 1993; 80/81 Zhang (10.1016/j.apsusc.2017.02.006_bib0015) 2012; 108 Aoki (10.1016/j.apsusc.2017.02.006_bib0095) 2009; 267 Huatala (10.1016/j.apsusc.2017.02.006_bib0140) 2004 Ziegler (10.1016/j.apsusc.2017.02.006_bib0100) 2013 Musumeci (10.1016/j.apsusc.2017.02.006_bib0125) 2016; 172 Benito (10.1016/j.apsusc.2017.02.006_bib0060) 2015; 351 Malherbe (10.1016/j.apsusc.2017.02.006_bib0155) 1986; 27 Wild (10.1016/j.apsusc.2017.02.006_bib0025) 1989; 14 Steinberger (10.1016/j.apsusc.2017.02.006_bib0075) 2015; 99 Aureau (10.1016/j.apsusc.2017.02.006_bib0080) 2016; 601 Hofmann (10.1016/j.apsusc.2017.02.006_bib0035) 1982; 1 Chaneliere (10.1016/j.apsusc.2017.02.006_bib0030) 1998; 22 Grilli (10.1016/j.apsusc.2017.02.006_bib0085) 2014; 21 Cleveland (10.1016/j.apsusc.2017.02.006_bib0115) 1992; 257 Mahoney (10.1016/j.apsusc.2017.02.006_bib0135) 2010; 29 Joshi (10.1016/j.apsusc.2017.02.006_bib0005) 1999; 86 Seah (10.1016/j.apsusc.2017.02.006_bib0130) 2016; 27 Yamada (10.1016/j.apsusc.2017.02.006_bib0110) 2000; 164–165 Malherbe (10.1016/j.apsusc.2017.02.006_bib0105) 1999; 144–145 Yamada (10.1016/j.apsusc.2017.02.006_bib0145) 2015 Sano (10.1016/j.apsusc.2017.02.006_bib0070) 2016; 48 Cheng (10.1016/j.apsusc.2017.02.006_bib0120) 2009; 267 Klein (10.1016/j.apsusc.2017.02.006_bib0160) 1972; 119 |
| References_xml | – volume: 14 start-page: 239 year: 1989 end-page: 244 ident: bib0025 article-title: Ion sputter rates of Cr–Mn–Fe spinel oxides publication-title: Surf. Interface Anal. – volume: 1 start-page: 213 year: 1982–1983 ident: bib0035 article-title: Quantitative XPS analysis of the surface layer of anodic oxides obtained during depth profiling by sputtering with 3 publication-title: J. Trace Microprobe Technol. – year: 2015 ident: bib0145 article-title: Materials Processing by Cluster Ion Beams, History, Technology and Applications – volume: 86 start-page: 871 year: 1999 end-page: 880 ident: bib0005 article-title: Influence of postdeposition annealing on the enhanced structural and electrical properties of amorphous and crystalline Ta publication-title: J. Appl. Phys. – volume: 28 start-page: 1060 year: 2010 ident: bib0055 article-title: Comparison of the sputter rates of oxide films relative to the sputter rate of SiO publication-title: J. Vac. Sci. Technol. A – volume: 119 start-page: 1551 year: 1972 end-page: 1560 ident: bib0160 article-title: Oxidation state of anodic tantalum oxide after heat treatment. I. Galvanostatic method as applied after heating in vacuum publication-title: J. Electrochem. Soc. – volume: 267 start-page: 1428 year: 2009 end-page: 1431 ident: bib0120 article-title: Molecular dynamics simulations of argon cluster impacts on a nickel film surface publication-title: Nucl. Instrum. Methods Phys. Res. B – volume: 144–145 start-page: 192 year: 1999 end-page: 200 ident: bib0105 article-title: Ion sputtering, surface topography, SPM and surface analysis of electronic materials publication-title: Appl. Surf. Sci. – volume: 351 start-page: 753 year: 2015 end-page: 759 ident: bib0060 article-title: Nanostructuring of Ta2O5 surfaces by low energy Ar publication-title: Appl. Surf. Sci. – volume: 27 start-page: 355 year: 1986 end-page: 365 ident: bib0155 article-title: Preferential sputtering of oxides: A comparison of model predictions with experimental data publication-title: Appl. Surf. Sci. – volume: 27 start-page: 1411 year: 2016 end-page: 1418 ident: bib0130 article-title: Sampling depths, depth shifts, and depth resolutions for Bi publication-title: J. Am. Soc. Mass Spectrom. – volume: 21 start-page: 68 year: 2014 end-page: 83 ident: bib0085 article-title: Comparison of Ar publication-title: Surf. Sci. Spectra – volume: 29 start-page: 247 year: 2010 end-page: 293 ident: bib0135 article-title: Cluster secondary ion mass spectrometry of polymers and related materials publication-title: Mass Spectrom. Rev. – volume: 180 start-page: 1 year: 2010 ident: bib0045 article-title: Formation of self-organized Ta nano-structures by argon ion sputtering of Ta foil: XPS and AFM study publication-title: J. Electron Spectrosc. Relat. Phenom. – volume: 99 start-page: 66 year: 2015 end-page: 75 ident: bib0075 article-title: XPS study of the effects of long term Ar publication-title: Corros. Sci. – volume: 116 start-page: 5 year: 2014 ident: bib0065 article-title: Observed damage during argon gas cluster depth profiles of compound semiconductors publication-title: J. Appl. Phys. – volume: 21 start-page: 50 year: 2014 end-page: 67 ident: bib0090 article-title: Comparison of Ar publication-title: Surf. Sci. Spectra – volume: 108 start-page: 975 year: 2012 end-page: 979 ident: bib0015 article-title: Thickness-dependence of optical constants for Ta publication-title: Appl. Phys. A – volume: 10 start-page: 9 year: 1999 end-page: 31 ident: bib0010 article-title: Preparation and properties of tantalum pentoxide (Ta publication-title: J. Mater. Sci.: Mater. Electron. – reference: U. Wätjen, M.P. Seah, S.J. Spencer, C. Ingelbrecht, The certification of a fourth batch of tantalum pentoxide on tantalum foil’ Report EUR 22610 EN, Office for Official Publications of the European Communities, Luxembourg, (2006). – volume: 48 start-page: 575 year: 2016 end-page: 579 ident: bib0070 article-title: Optimal conditions for gas cluster ion beams in studying inorganic interface species: improved chemical information at a ZnO interface publication-title: Surf. Interface Anal. – volume: 267 start-page: 2999 year: 2009 end-page: 3001 ident: bib0095 article-title: Study of density effect of large gas cluster impact by molecular dynamics simulations publication-title: Nucl. Instrum. Methods Phys. Res. Sect. B: Beam Interact. Mater. At. – volume: 16 start-page: 793 year: 1979 ident: bib0040 article-title: Preferential sputtering of Ta publication-title: J. Vac. Sci. Technol. – volume: 169 start-page: 41 year: 2009 ident: bib0050 article-title: XPS depth-profile of the suboxide distribution at the native oxide/Ta interface publication-title: J. Electron Spectrosc. Relat. Phenom. – volume: 172 start-page: 224 year: 2016 end-page: 230 ident: bib0125 article-title: Spectroscopic evidences of high temperatures and pressures during the cluster ion beam interaction with solid surfaces publication-title: J. Lumin. – volume: 601 start-page: 89 year: 2016 end-page: 92 ident: bib0080 article-title: Advanced analysis tool for X-ray photoelectron spectroscopy profiling: cleaning of perovskite SrTiO publication-title: Thin Solid Films – volume: 257 start-page: 355 year: 1992 end-page: 361 ident: bib0115 article-title: Dynamics of cluster-surface collisions publication-title: Science – volume: 80/81 start-page: 1154 year: 1993 end-page: 1163 ident: bib0150 article-title: Composition changes in bombarded oxides and carbides: the distinction between ballistic, chemically guided, and chemically random behaviour publication-title: Nucl. Instrum. Methods Phys. Res. B – volume: 22 start-page: 269 year: 1998 end-page: 322 ident: bib0030 article-title: Tantalum pentoxide (Ta publication-title: Mater. Sci. Eng. R: Rep. – start-page: 50 year: 2004 end-page: 53 ident: bib0140 publication-title: IEEE 4th International Workshop on Junction Technology – reference: P. Mack, unpublished work. – year: 2013 ident: bib0100 article-title: SRIM—The Stopping and Range of Ions in Matter – volume: 164–165 start-page: 944 year: 2000 end-page: 959 ident: bib0110 publication-title: Nucl. Instrum. Methods Phys. Res. B – volume: 267 start-page: 2999 year: 2009 ident: 10.1016/j.apsusc.2017.02.006_bib0095 article-title: Study of density effect of large gas cluster impact by molecular dynamics simulations publication-title: Nucl. Instrum. Methods Phys. Res. Sect. B: Beam Interact. Mater. At. doi: 10.1016/j.nimb.2009.06.019 – ident: 10.1016/j.apsusc.2017.02.006_bib0020 – volume: 108 start-page: 975 year: 2012 ident: 10.1016/j.apsusc.2017.02.006_bib0015 article-title: Thickness-dependence of optical constants for Ta2O5 ultrathin films publication-title: Appl. Phys. A doi: 10.1007/s00339-012-7007-2 – volume: 601 start-page: 89 year: 2016 ident: 10.1016/j.apsusc.2017.02.006_bib0080 article-title: Advanced analysis tool for X-ray photoelectron spectroscopy profiling: cleaning of perovskite SrTiO3 oxide surface using argon cluster ion source publication-title: Thin Solid Films doi: 10.1016/j.tsf.2015.11.017 – year: 2013 ident: 10.1016/j.apsusc.2017.02.006_bib0100 – volume: 257 start-page: 355 year: 1992 ident: 10.1016/j.apsusc.2017.02.006_bib0115 article-title: Dynamics of cluster-surface collisions publication-title: Science doi: 10.1126/science.257.5068.355 – volume: 10 start-page: 9 year: 1999 ident: 10.1016/j.apsusc.2017.02.006_bib0010 article-title: Preparation and properties of tantalum pentoxide (Ta2O5) thin films for ultra large scale integrated circuits (ULSIs) application—a review publication-title: J. Mater. Sci.: Mater. Electron. – volume: 1 start-page: 213 year: 1982 ident: 10.1016/j.apsusc.2017.02.006_bib0035 article-title: Quantitative XPS analysis of the surface layer of anodic oxides obtained during depth profiling by sputtering with 3keV Ar+ ions publication-title: J. Trace Microprobe Technol. – volume: 99 start-page: 66 year: 2015 ident: 10.1016/j.apsusc.2017.02.006_bib0075 article-title: XPS study of the effects of long term Ar+ ion and Ar cluster sputtering on the chemical degradation of hydrozincite and iron oxide publication-title: Corros. Sci. doi: 10.1016/j.corsci.2015.06.019 – volume: 86 start-page: 871 year: 1999 ident: 10.1016/j.apsusc.2017.02.006_bib0005 article-title: Influence of postdeposition annealing on the enhanced structural and electrical properties of amorphous and crystalline Ta2O5 thin films for dynamic random access memory applications publication-title: J. Appl. Phys. doi: 10.1063/1.370817 – volume: 16 start-page: 793 year: 1979 ident: 10.1016/j.apsusc.2017.02.006_bib0040 article-title: Preferential sputtering of Ta2O5 by argon ions publication-title: J. Vac. Sci. Technol. doi: 10.1116/1.570088 – volume: 172 start-page: 224 year: 2016 ident: 10.1016/j.apsusc.2017.02.006_bib0125 article-title: Spectroscopic evidences of high temperatures and pressures during the cluster ion beam interaction with solid surfaces publication-title: J. Lumin. doi: 10.1016/j.jlumin.2015.12.018 – volume: 28 start-page: 1060 year: 2010 ident: 10.1016/j.apsusc.2017.02.006_bib0055 article-title: Comparison of the sputter rates of oxide films relative to the sputter rate of SiO2 publication-title: J. Vac. Sci. Technol. A doi: 10.1116/1.3456123 – year: 2015 ident: 10.1016/j.apsusc.2017.02.006_bib0145 – volume: 116 start-page: 5 year: 2014 ident: 10.1016/j.apsusc.2017.02.006_bib0065 article-title: Observed damage during argon gas cluster depth profiles of compound semiconductors publication-title: J. Appl. Phys. doi: 10.1063/1.4892097 – volume: 27 start-page: 355 year: 1986 ident: 10.1016/j.apsusc.2017.02.006_bib0155 article-title: Preferential sputtering of oxides: A comparison of model predictions with experimental data publication-title: Appl. Surf. Sci. doi: 10.1016/0169-4332(86)90139-X – volume: 144–145 start-page: 192 year: 1999 ident: 10.1016/j.apsusc.2017.02.006_bib0105 article-title: Ion sputtering, surface topography, SPM and surface analysis of electronic materials publication-title: Appl. Surf. Sci. doi: 10.1016/S0169-4332(98)00796-X – volume: 180 start-page: 1 year: 2010 ident: 10.1016/j.apsusc.2017.02.006_bib0045 article-title: Formation of self-organized Ta nano-structures by argon ion sputtering of Ta foil: XPS and AFM study publication-title: J. Electron Spectrosc. Relat. Phenom. doi: 10.1016/j.elspec.2010.02.006 – volume: 48 start-page: 575 year: 2016 ident: 10.1016/j.apsusc.2017.02.006_bib0070 article-title: Optimal conditions for gas cluster ion beams in studying inorganic interface species: improved chemical information at a ZnO interface publication-title: Surf. Interface Anal. doi: 10.1002/sia.5949 – volume: 29 start-page: 247 year: 2010 ident: 10.1016/j.apsusc.2017.02.006_bib0135 article-title: Cluster secondary ion mass spectrometry of polymers and related materials publication-title: Mass Spectrom. Rev. doi: 10.1002/mas.20233 – volume: 169 start-page: 41 year: 2009 ident: 10.1016/j.apsusc.2017.02.006_bib0050 article-title: XPS depth-profile of the suboxide distribution at the native oxide/Ta interface publication-title: J. Electron Spectrosc. Relat. Phenom. doi: 10.1016/j.elspec.2008.10.004 – volume: 21 start-page: 68 issue: 1 year: 2014 ident: 10.1016/j.apsusc.2017.02.006_bib0085 article-title: Comparison of Ar+ monoatomic and cluster ion sputtering of Ta2O5 at different ion energies, by XPS: part 2—cluster ions publication-title: Surf. Sci. Spectra doi: 10.1116/11.20140702 – volume: 164–165 start-page: 944 year: 2000 ident: 10.1016/j.apsusc.2017.02.006_bib0110 publication-title: Nucl. Instrum. Methods Phys. Res. B doi: 10.1016/S0168-583X(99)01163-5 – start-page: 50 year: 2004 ident: 10.1016/j.apsusc.2017.02.006_bib0140 publication-title: IEEE 4th International Workshop on Junction Technology – volume: 267 start-page: 1428 year: 2009 ident: 10.1016/j.apsusc.2017.02.006_bib0120 article-title: Molecular dynamics simulations of argon cluster impacts on a nickel film surface publication-title: Nucl. Instrum. Methods Phys. Res. B doi: 10.1016/j.nimb.2009.01.056 – volume: 80/81 start-page: 1154 year: 1993 ident: 10.1016/j.apsusc.2017.02.006_bib0150 article-title: Composition changes in bombarded oxides and carbides: the distinction between ballistic, chemically guided, and chemically random behaviour publication-title: Nucl. Instrum. Methods Phys. Res. B doi: 10.1016/0168-583X(93)90755-U – ident: 10.1016/j.apsusc.2017.02.006_bib0165 – volume: 14 start-page: 239 year: 1989 ident: 10.1016/j.apsusc.2017.02.006_bib0025 article-title: Ion sputter rates of Cr–Mn–Fe spinel oxides publication-title: Surf. Interface Anal. doi: 10.1002/sia.740140505 – volume: 351 start-page: 753 year: 2015 ident: 10.1016/j.apsusc.2017.02.006_bib0060 article-title: Nanostructuring of Ta2O5 surfaces by low energy Ar+ bombardment publication-title: Appl. Surf. Sci. doi: 10.1016/j.apsusc.2015.05.143 – volume: 119 start-page: 1551 year: 1972 ident: 10.1016/j.apsusc.2017.02.006_bib0160 article-title: Oxidation state of anodic tantalum oxide after heat treatment. I. Galvanostatic method as applied after heating in vacuum publication-title: J. Electrochem. Soc. doi: 10.1149/1.2404041 – volume: 22 start-page: 269 year: 1998 ident: 10.1016/j.apsusc.2017.02.006_bib0030 article-title: Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications publication-title: Mater. Sci. Eng. R: Rep. doi: 10.1016/S0927-796X(97)00023-5 – volume: 21 start-page: 50 issue: 1 year: 2014 ident: 10.1016/j.apsusc.2017.02.006_bib0090 article-title: Comparison of Ar+ monoatomic and cluster ion sputtering of Ta2O5 at different ion energies, by XPS: part 1—monoatomic ions publication-title: Surf. Sci. Spectra doi: 10.1116/11.20140701 – volume: 27 start-page: 1411 year: 2016 ident: 10.1016/j.apsusc.2017.02.006_bib0130 article-title: Sampling depths, depth shifts, and depth resolutions for Bin+ ion analysis in argon gas cluster depth profiles publication-title: J. Am. Soc. Mass Spectrom. doi: 10.1007/s13361-016-1401-5 |
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