Simpson, R., White, R. G., Watts, J. F., & Baker, M. A. (2017). XPS investigation of monatomic and cluster argon ion sputtering of tantalum pentoxide. Applied surface science, 405, 79-87. https://doi.org/10.1016/j.apsusc.2017.02.006
Citácia podle Chicago (17th ed.)Simpson, Robin, Richard G. White, John F. Watts, a Mark A. Baker. "XPS Investigation of Monatomic and Cluster Argon Ion Sputtering of Tantalum Pentoxide." Applied Surface Science 405 (2017): 79-87. https://doi.org/10.1016/j.apsusc.2017.02.006.
Citácia podľa MLA (8th ed.)Simpson, Robin, et al. "XPS Investigation of Monatomic and Cluster Argon Ion Sputtering of Tantalum Pentoxide." Applied Surface Science, vol. 405, 2017, pp. 79-87, https://doi.org/10.1016/j.apsusc.2017.02.006.
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