Thermal stability of oxygen vacancy stabilized zirconia (OVSZ) thin films

Thermal stability of reactive magnetron sputter deposited oxygen vacancy stabilized cubic zirconia (OVSZ) thin films containing 16 and 3 at.% oxygen vacancies is reported. Temperature-resolved grazing incidence X-ray diffraction (TR-GIXRD) measurements (200–900 °C) in air and nitrogen atmosphere wer...

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Bibliographic Details
Published in:	Surface & coatings technology Vol. 409; p. 126880
Main Authors:	Raza, Mohsin, Boulet, Pascal, Pierson, Jean-François, Snyders, Rony, Konstantinidis, Stéphanos
Format:	Journal Article
Language:	English
Published:	Lausanne Elsevier B.V 15.03.2021 Elsevier BV Elsevier
Subjects:	Chemical Sciences Compressive properties Condensed Matter Cubic zirconia Material chemistry Materials Science Oxygen Oxygen vacancy Phase transformation Physics Stress Substrates Thermal cycling Thermal expansion Thermal stability Thin films Vacancies Zirconium dioxide Phase transformation Cubic zirconia Thermal stability Stress Oxygen vacancy
ISSN:	0257-8972, 1879-3347, 1879-3347
Online Access:	Get full text
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