Multiscale computational fluid dynamics modeling of an area-selective atomic layer deposition process using a discrete feed method

Area-selective atomic layer deposition (AS-ALD) is a beneficial procedure that facilitates self-alignment for transistor stacking by concentrating oxide growth on targeted areas of a substrate. However, AS-ALD is difficult to incorporate into semiconductor manufacturing industries due to difficultie...

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Bibliographic Details

Published in:	Digital Chemical Engineering Vol. 10; p. 100140
Main Authors:	Wang, Henrik, Tom, Matthew, Ou, Feiyang, Orkoulas, Gerassimos, Christofides, Panagiotis D.
Format:	Journal Article
Language:	English
Published:	Elsevier Ltd 01.03.2024 Elsevier
Subjects:	Area-selective atomic layer deposition Multiscale computational fluid dynamics modeling Reactor optimal design Reactor optimal operation Semiconductor manufacturing processes Area-selective atomic layer deposition Reactor optimal operation Semiconductor manufacturing processes Multiscale computational fluid dynamics modeling Reactor optimal design
ISSN:	2772-5081, 2772-5081
Online Access:	Get full text
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