Electrical properties of strained off-stoichiometric Cu–Cr–O delafossite thin films

Off-stoichiometric Cu-Cr-O delafossite thin films with different thicknesses were grown by metal organic chemical vapor deposition on substrates with different coefficients of thermal expansion. Seebeck thermoelectric coefficient and resistivity measurements were performed on the range of 300-850 K....

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Veröffentlicht in:	Journal of physics. Condensed matter Jg. 36; H. 21
Hauptverfasser:	Moreira, Marco, Crêpellière, Jonathan, Polesel-Maris, Jérôme, Leturcq, Renaud, Guillot, Jérôme, Fleming, Yves, Lunca-Popa, Petru
Format:	Journal Article
Sprache:	Englisch
Veröffentlicht:	England IOP Publishing 29.05.2024
Schlagworte:	copper chromium oxide delafossite electronic properties strain strain electronic properties off-stoichiometric copper chromium oxide
ISSN:	0953-8984, 1361-648X, 1361-648X
Online-Zugang:	Volltext
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