Fabrication and characterization of nickel thin film as resistance temperature detector
In practical applications, thin film resistance temperature detectors (RTD) are often used in the environments that the attached substrates cannot stand high temperature. Therefore, it is necessary to prepare thin film RTDs by a low temperature process. In this study, the fabrication of nickel (Ni)...
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| Vydané v: | Vacuum Ročník 176; s. 109288 |
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01.06.2020
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| Abstract | In practical applications, thin film resistance temperature detectors (RTD) are often used in the environments that the attached substrates cannot stand high temperature. Therefore, it is necessary to prepare thin film RTDs by a low temperature process. In this study, the fabrication of nickel (Ni) thin film RTDs at low temperatures is investigated by direct-current (DC) magnetron sputtering. It is found that the dense and uniform Ni thin film can be prepared even at room temperature. The effects of sputter pressure and power on thin film microscopic morphology and structure are also investigated. The Ni thin film RTDs prepared at room temperature exhibit a value of temperature coefficient of resistance (TCR) about 3000 ppm/°C and excellent repeatability under cycling temperatures.
•A method for preparing a Ni thin film having a high TCR (~3000 ppm/°C), good linearity, and reproducibility at room temperature was found•This can solve the film temperature measurement of a device that is difficult to withstand high temperatures.•It has certain effect and significance for solving some problems in the industry. |
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| AbstractList | In practical applications, thin film resistance temperature detectors (RTD) are often used in the environments that the attached substrates cannot stand high temperature. Therefore, it is necessary to prepare thin film RTDs by a low temperature process. In this study, the fabrication of nickel (Ni) thin film RTDs at low temperatures is investigated by direct-current (DC) magnetron sputtering. It is found that the dense and uniform Ni thin film can be prepared even at room temperature. The effects of sputter pressure and power on thin film microscopic morphology and structure are also investigated. The Ni thin film RTDs prepared at room temperature exhibit a value of temperature coefficient of resistance (TCR) about 3000 ppm/°C and excellent repeatability under cycling temperatures.
•A method for preparing a Ni thin film having a high TCR (~3000 ppm/°C), good linearity, and reproducibility at room temperature was found•This can solve the film temperature measurement of a device that is difficult to withstand high temperatures.•It has certain effect and significance for solving some problems in the industry. |
| ArticleNumber | 109288 |
| Author | Liu, Hao Song, Ying Li, Xingliang Jiang, Shuwen Zhang, Wanli Cui, Jinting Zhang, Bin |
| Author_xml | – sequence: 1 givenname: Jinting orcidid: 0000-0003-3468-0844 surname: Cui fullname: Cui, Jinting email: 254899335@qq.com organization: State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Electronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 610054, China – sequence: 2 givenname: Hao surname: Liu fullname: Liu, Hao organization: State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Electronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 610054, China – sequence: 3 givenname: Xingliang surname: Li fullname: Li, Xingliang organization: Aviation Key Laboratory of Science and Technology on Precision Manufacturing, Beijing Precision Engineering Institute for Aircraft Industry, Beijing, 100076, China – sequence: 4 givenname: Shuwen surname: Jiang fullname: Jiang, Shuwen email: jiangsw@uestc.edu.cn organization: State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Electronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 610054, China – sequence: 5 givenname: Bin surname: Zhang fullname: Zhang, Bin organization: Aviation Key Laboratory of Science and Technology on Precision Manufacturing, Beijing Precision Engineering Institute for Aircraft Industry, Beijing, 100076, China – sequence: 6 givenname: Ying surname: Song fullname: Song, Ying organization: Aviation Key Laboratory of Science and Technology on Precision Manufacturing, Beijing Precision Engineering Institute for Aircraft Industry, Beijing, 100076, China – sequence: 7 givenname: Wanli surname: Zhang fullname: Zhang, Wanli organization: State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Electronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 610054, China |
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| Cites_doi | 10.1016/S0040-6090(01)01773-4 10.1016/S0921-5093(00)01587-2 10.1016/j.surfcoat.2010.04.005 10.1116/1.1815313 10.1016/0040-6090(81)90608-8 10.1016/0040-6090(87)90159-3 10.1016/j.vacuum.2015.05.026 10.1107/S0021889887087090 10.1016/j.matlet.2014.03.170 10.1007/BF02707199 10.1166/jno.2014.1555 10.1007/BF03047543 10.1016/j.tsf.2013.06.012 10.1134/S1063783414100291 10.1016/j.vacuum.2016.07.028 10.1016/S1359-6454(02)00177-5 10.1088/0022-3727/41/18/185404 10.1186/s40486-017-0060-z 10.1063/1.344049 |
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| References | Talanin, Talanin (bib13) 2014; 56 Thompson, Cox, Hastings (bib15) 1987; 20 Kasap (bib16) 2009 Kang, Park, Park (bib19) 2017; 5 Diehl (bib1) 1984 Chuang, Lin, Chen (bib10) 2015; 119 Huang, Howard (bib12) 1987; 148 Kim, Kim, Shin (bib2) 2001; 18 Han, Cheng, Wang, Zhang, Zhang, Wang, Duan, Ding (bib4) 2014; 125 Zhang, Smith, Evans (bib7) 2002; 50 Hur, Kim, Kang (bib18) 2004; 22 Lele, Anantharaman (bib14) 1966; 64 Tang, Zhang, Jin, Shao, Hu, Xie (bib21) 2015; 34 Kawashima, Habazaki, Hashimoto (bib8) 2001; 304 Xu, Shao, Wei (bib11) 2010; 204 Sinclair, West (bib9) 1989; 66 Wang, Zhang, Li (bib5) 2017; 140 Ha, Kim (bib17) 2014; 9 Gregory, Luo, Crisman (bib3) 2002; 406 P. Kocian, The mechanism of deposition in a silane plasma, Thin Solid Films, 80 (4) 1981. Garraud, Combette, Giani (bib6) 2013; 540 Chung, Nautiyal, Chen (bib22) 2008; 41 Talanin (10.1016/j.vacuum.2020.109288_bib13) 2014; 56 Kawashima (10.1016/j.vacuum.2020.109288_bib8) 2001; 304 Tang (10.1016/j.vacuum.2020.109288_bib21) 2015; 34 Chung (10.1016/j.vacuum.2020.109288_bib22) 2008; 41 Sinclair (10.1016/j.vacuum.2020.109288_bib9) 1989; 66 Ha (10.1016/j.vacuum.2020.109288_bib17) 2014; 9 Hur (10.1016/j.vacuum.2020.109288_bib18) 2004; 22 Thompson (10.1016/j.vacuum.2020.109288_bib15) 1987; 20 Chuang (10.1016/j.vacuum.2020.109288_bib10) 2015; 119 Kang (10.1016/j.vacuum.2020.109288_bib19) 2017; 5 Diehl (10.1016/j.vacuum.2020.109288_bib1) 1984 Xu (10.1016/j.vacuum.2020.109288_bib11) 2010; 204 Huang (10.1016/j.vacuum.2020.109288_bib12) 1987; 148 Gregory (10.1016/j.vacuum.2020.109288_bib3) 2002; 406 Garraud (10.1016/j.vacuum.2020.109288_bib6) 2013; 540 Kasap (10.1016/j.vacuum.2020.109288_bib16) 2009 10.1016/j.vacuum.2020.109288_bib20 Zhang (10.1016/j.vacuum.2020.109288_bib7) 2002; 50 Kim (10.1016/j.vacuum.2020.109288_bib2) 2001; 18 Lele (10.1016/j.vacuum.2020.109288_bib14) 1966; 64 Han (10.1016/j.vacuum.2020.109288_bib4) 2014; 125 Wang (10.1016/j.vacuum.2020.109288_bib5) 2017; 140 |
| References_xml | – volume: 9 year: 2014 ident: bib17 article-title: Effect of annealing on the temperature coefficient of resistance of TiAIN film deposited by facing target sputtering publication-title: J. Nanoelectron. Optoelectron. – volume: 20 start-page: 79 year: 1987 end-page: 83 ident: bib15 article-title: Rietveld refinement of Debye–Scherrer synchrotron X-ray data from Al publication-title: J. Appl. Crystallogr. – reference: P. Kocian, The mechanism of deposition in a silane plasma, Thin Solid Films, 80 (4) 1981. – volume: 140 start-page: 121 year: 2017 end-page: 125 ident: bib5 article-title: Fabrication and characterization of ITO thin film resistance temperature detector publication-title: Vacuum – volume: 119 start-page: 200 year: 2015 end-page: 203 ident: bib10 article-title: TCR control of Ni–Cr resistive film deposited by DC magnetron sputtering publication-title: Vacuum – volume: 41 start-page: 185400 year: 2008 ident: bib22 article-title: Grain boundary scattering for temperature coefficient of resistance (TCR) behaviour of Ta–Si–N thin films publication-title: J. Phys. D Appl. Phys. – volume: 540 start-page: 256 year: 2013 end-page: 261 ident: bib6 article-title: Thermal stability of Pt/Cr and Pt/Cr publication-title: Thin Solid Films – volume: 34 year: 2015 ident: bib21 article-title: Influence of sputtering pressures on the optical properties of manganese film based on spectroscopic ellipsometry publication-title: J. Infrared Millim. Waves – volume: 125 start-page: 224 year: 2014 end-page: 226 ident: bib4 article-title: MEMS-based Pt film temperature sensor on an alumina substrate publication-title: Mater. Lett. – volume: 50 start-page: 3803 year: 2002 end-page: 3816 ident: bib7 article-title: The connection between ab initio calculations and interface adhesion measurements on metal/oxide systems: Ni/Al publication-title: Acta Mater. – volume: 18 start-page: 61 year: 2001 end-page: 66 ident: bib2 article-title: A study on the fabrication of an RTD (resistance temperature detector) by using Pt thin film publication-title: Kor. J. Chem. Eng. – volume: 22 start-page: 2698 year: 2004 end-page: 2701 ident: bib18 article-title: Effect of the deposition temperature on temperature coefficient of resistance in CuNi thin film resistors publication-title: J. Vac. Sci. Technol., B – volume: 148 start-page: 209 year: 1987 end-page: 218 ident: bib12 article-title: Characterization of Ni-Cr thin films by X-ray analysis publication-title: Thin Solid Films – volume: 5 start-page: 26 year: 2017 ident: bib19 article-title: Temperature control of micro heater using Pt thin film temperature sensor embedded in micro gas sensor publication-title: Micro Nano Syst. Lett. – volume: 406 start-page: 286 year: 2002 end-page: 293 ident: bib3 article-title: High temperature stability of indium tin oxide thin films publication-title: Thin Solid Films – volume: 66 start-page: 3850 year: 1989 ident: bib9 article-title: Impedance and modulus spectroscopy of semiconducting BaTiO3 showing positive temperature coefficient of resistance publication-title: J. Appl. Phys. – year: 2009 ident: bib16 article-title: Principles of Electronic Materials and Devices – volume: 56 start-page: 2043 year: 2014 end-page: 2049 ident: bib13 article-title: On the problem of the consistency of the high-temperature precipitation model with the classical nucleation theory publication-title: Phys. Solid State – volume: 204 start-page: 3443 year: 2010 end-page: 3450 ident: bib11 article-title: Effect of ion beam bombardment on the properties of Ni films deposited on polyimide by ion beam assisted deposition publication-title: Surf. Coating. Technol. – volume: 64 start-page: 261 year: 1966 end-page: 274 ident: bib14 article-title: Influence of crystallite shape on particle size broadening of Debye-Scherrer reflections publication-title: Proc. Math. Sci. – volume: 304 start-page: 753 year: 2001 end-page: 757 ident: bib8 article-title: Highly corrosion-resistant Ni-based bulk amorphous alloys publication-title: Mater. Sci. Eng., A – start-page: 85 year: 1984 ident: bib1 article-title: Platinum thin film resistors as accurate and stable temperature sensors publication-title: NASA STI/Recon. Tech. Rep. N – volume: 406 start-page: 286 year: 2002 ident: 10.1016/j.vacuum.2020.109288_bib3 article-title: High temperature stability of indium tin oxide thin films publication-title: Thin Solid Films doi: 10.1016/S0040-6090(01)01773-4 – volume: 304 start-page: 753 year: 2001 ident: 10.1016/j.vacuum.2020.109288_bib8 article-title: Highly corrosion-resistant Ni-based bulk amorphous alloys publication-title: Mater. Sci. Eng., A doi: 10.1016/S0921-5093(00)01587-2 – volume: 204 start-page: 3443 year: 2010 ident: 10.1016/j.vacuum.2020.109288_bib11 article-title: Effect of ion beam bombardment on the properties of Ni films deposited on polyimide by ion beam assisted deposition publication-title: Surf. Coating. Technol. doi: 10.1016/j.surfcoat.2010.04.005 – volume: 22 start-page: 2698 year: 2004 ident: 10.1016/j.vacuum.2020.109288_bib18 article-title: Effect of the deposition temperature on temperature coefficient of resistance in CuNi thin film resistors publication-title: J. Vac. Sci. Technol., B doi: 10.1116/1.1815313 – ident: 10.1016/j.vacuum.2020.109288_bib20 doi: 10.1016/0040-6090(81)90608-8 – volume: 148 start-page: 209 year: 1987 ident: 10.1016/j.vacuum.2020.109288_bib12 article-title: Characterization of Ni-Cr thin films by X-ray analysis publication-title: Thin Solid Films doi: 10.1016/0040-6090(87)90159-3 – volume: 119 start-page: 200 year: 2015 ident: 10.1016/j.vacuum.2020.109288_bib10 article-title: TCR control of Ni–Cr resistive film deposited by DC magnetron sputtering publication-title: Vacuum doi: 10.1016/j.vacuum.2015.05.026 – volume: 20 start-page: 79 year: 1987 ident: 10.1016/j.vacuum.2020.109288_bib15 article-title: Rietveld refinement of Debye–Scherrer synchrotron X-ray data from Al2O3 publication-title: J. Appl. Crystallogr. doi: 10.1107/S0021889887087090 – volume: 125 start-page: 224 year: 2014 ident: 10.1016/j.vacuum.2020.109288_bib4 article-title: MEMS-based Pt film temperature sensor on an alumina substrate publication-title: Mater. Lett. doi: 10.1016/j.matlet.2014.03.170 – volume: 18 start-page: 61 year: 2001 ident: 10.1016/j.vacuum.2020.109288_bib2 article-title: A study on the fabrication of an RTD (resistance temperature detector) by using Pt thin film publication-title: Kor. J. Chem. Eng. doi: 10.1007/BF02707199 – volume: 9 year: 2014 ident: 10.1016/j.vacuum.2020.109288_bib17 article-title: Effect of annealing on the temperature coefficient of resistance of TiAIN film deposited by facing target sputtering publication-title: J. Nanoelectron. Optoelectron. doi: 10.1166/jno.2014.1555 – volume: 64 start-page: 261 year: 1966 ident: 10.1016/j.vacuum.2020.109288_bib14 article-title: Influence of crystallite shape on particle size broadening of Debye-Scherrer reflections publication-title: Proc. Math. Sci. doi: 10.1007/BF03047543 – volume: 540 start-page: 256 year: 2013 ident: 10.1016/j.vacuum.2020.109288_bib6 article-title: Thermal stability of Pt/Cr and Pt/Cr2O3 thin-film layers on a SiNx/Si substrate for thermal sensor applications publication-title: Thin Solid Films doi: 10.1016/j.tsf.2013.06.012 – volume: 56 start-page: 2043 year: 2014 ident: 10.1016/j.vacuum.2020.109288_bib13 article-title: On the problem of the consistency of the high-temperature precipitation model with the classical nucleation theory publication-title: Phys. Solid State doi: 10.1134/S1063783414100291 – volume: 140 start-page: 121 year: 2017 ident: 10.1016/j.vacuum.2020.109288_bib5 article-title: Fabrication and characterization of ITO thin film resistance temperature detector publication-title: Vacuum doi: 10.1016/j.vacuum.2016.07.028 – volume: 50 start-page: 3803 year: 2002 ident: 10.1016/j.vacuum.2020.109288_bib7 article-title: The connection between ab initio calculations and interface adhesion measurements on metal/oxide systems: Ni/Al2O3 and Cu/Al2O3 publication-title: Acta Mater. doi: 10.1016/S1359-6454(02)00177-5 – volume: 41 start-page: 185400 year: 2008 ident: 10.1016/j.vacuum.2020.109288_bib22 article-title: Grain boundary scattering for temperature coefficient of resistance (TCR) behaviour of Ta–Si–N thin films publication-title: J. Phys. D Appl. Phys. doi: 10.1088/0022-3727/41/18/185404 – volume: 5 start-page: 26 year: 2017 ident: 10.1016/j.vacuum.2020.109288_bib19 article-title: Temperature control of micro heater using Pt thin film temperature sensor embedded in micro gas sensor publication-title: Micro Nano Syst. Lett. doi: 10.1186/s40486-017-0060-z – volume: 66 start-page: 3850 year: 1989 ident: 10.1016/j.vacuum.2020.109288_bib9 article-title: Impedance and modulus spectroscopy of semiconducting BaTiO3 showing positive temperature coefficient of resistance publication-title: J. Appl. Phys. doi: 10.1063/1.344049 – start-page: 85 year: 1984 ident: 10.1016/j.vacuum.2020.109288_bib1 article-title: Platinum thin film resistors as accurate and stable temperature sensors publication-title: NASA STI/Recon. Tech. Rep. N – volume: 34 year: 2015 ident: 10.1016/j.vacuum.2020.109288_bib21 article-title: Influence of sputtering pressures on the optical properties of manganese film based on spectroscopic ellipsometry publication-title: J. Infrared Millim. Waves – year: 2009 ident: 10.1016/j.vacuum.2020.109288_bib16 |
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