Diamond polishing

The empirical know-how of single crystalline diamond polishing has been developed over centuries in the diamond gem cutting industry. Since the 1950s new and varied uses and potential applications for synthetically produced diamond have been consistently proposed and developed. This innovation proce...

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Published in:Diamond and related materials Vol. 32; pp. 17 - 26
Main Authors: Schuelke, Thomas, Grotjohn, Timothy A.
Format: Journal Article
Language:English
Published: Amsterdam Elsevier B.V 01.02.2013
Elsevier
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ISSN:0925-9635, 1879-0062
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Abstract The empirical know-how of single crystalline diamond polishing has been developed over centuries in the diamond gem cutting industry. Since the 1950s new and varied uses and potential applications for synthetically produced diamond have been consistently proposed and developed. This innovation process continues with the availability of ever better, more specialized and less costly single crystalline and polycrystalline diamond materials. Yet, the potential exploitation of this hardest of materials is still in its infancy. Polishing is a critical and limiting step for advancing diamond applications in terms of cost effective processing and the achievable material surface finish. The current state-of-the-art of polishing single crystalline and polycrystalline diamond materials is reviewed based on the published literature. The material removal process during traditional mechanical polishing using diamond grit and polishing wheels is strongly anisotropic and depends upon crystal planes and polishing directions. Wear debris analyses and molecular dynamic simulations led to the understanding that this anisotropy is primarily caused by a mechanically induced transition from diamond to an amorphous carbon phase rather than by microchipping as previously thought. Mechanical polishing also leads to subsurface damage and limits the achievable surface finish for single crystalline diamond. Advanced techniques are discussed to improve the polished crystal's surface quality. Mechanical polishing of polycrystalline diamond films and freestanding plates is particularly slow due to the intrinsic structure variations in such materials. To overcome these limitations faster polishing techniques have been developed and are reviewed and compared. These techniques introduce additional chemical and physical means of material removal extending the capabilities of mechanical polishing. There is no single method that can address all requirements, but the available variety affords the careful selection of an optimal process for a given task. Finally, while diamond polishing is a subject of interest since centuries, it still remains a very important research area required to unfold the promise of diamond as a technical material.
AbstractList The empirical know-how of single crystalline diamond polishing has been developed over centuries in the diamond gem cutting industry. Since the 1950s new and varied uses and potential applications for synthetically produced diamond have been consistently proposed and developed. This innovation process continues with the availability of ever better, more specialized and less costly single crystalline and polycrystalline diamond materials. Yet, the potential exploitation of this hardest of materials is still in its infancy. Polishing is a critical and limiting step for advancing diamond applications in terms of cost effective processing and the achievable material surface finish. The current state-of-the-art of polishing single crystalline and polycrystalline diamond materials is reviewed based on the published literature. The material removal process during traditional mechanical polishing using diamond grit and polishing wheels is strongly anisotropic and depends upon crystal planes and polishing directions. Wear debris analyses and molecular dynamic simulations led to the understanding that this anisotropy is primarily caused by a mechanically induced transition from diamond to an amorphous carbon phase rather than by microchipping as previously thought. Mechanical polishing also leads to subsurface damage and limits the achievable surface finish for single crystalline diamond. Advanced techniques are discussed to improve the polished crystal's surface quality. Mechanical polishing of polycrystalline diamond films and freestanding plates is particularly slow due to the intrinsic structure variations in such materials. To overcome these limitations faster polishing techniques have been developed and are reviewed and compared. These techniques introduce additional chemical and physical means of material removal extending the capabilities of mechanical polishing. There is no single method that can address all requirements, but the available variety affords the careful selection of an optimal process for a given task. Finally, while diamond polishing is a subject of interest since centuries, it still remains a very important research area required to unfold the promise of diamond as a technical material.
Author Grotjohn, Timothy A.
Schuelke, Thomas
Author_xml – sequence: 1
  givenname: Thomas
  surname: Schuelke
  fullname: Schuelke, Thomas
  email: tschuelke@fraunhofer.org
  organization: Fraunhofer USA Center for Coatings and Laser Applications, East Lansing, MI, USA
– sequence: 2
  givenname: Timothy A.
  surname: Grotjohn
  fullname: Grotjohn, Timothy A.
  organization: Electrical and Computer Engineering, Michigan State University, East Lansing, MI, USA
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Keywords Chemo-mechanical
Polishing
Diamond
Etching
Thermo-mechanical
Synthetic diamond
Molecular dynamics method
Theoretical study
Mechanical properties
Light emitting diodes
Surface treatments
Carbon
Crystal perfection
Polycrystalline diamond
Cutting
Monocrystals
Reviews
Anisotropy
Wear
Crystal faces
Damage
Tribology
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PublicationTitle Diamond and related materials
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Elsevier
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Snippet The empirical know-how of single crystalline diamond polishing has been developed over centuries in the diamond gem cutting industry. Since the 1950s new and...
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SubjectTerms Anisotropy
Applied sciences
Chemo-mechanical
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science; rheology
Crystal structure
Diamond
Diamond machining
Diamond polishing
Electronics
Etching
Exact sciences and technology
Fullerenes and related materials; diamonds, graphite
Materials science
Materials selection
Mechanical and acoustical properties
Mechanical polishing
Optoelectronic devices
Physical properties of thin films, nonelectronic
Physics
Polishing
Polycrystalline diamond
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Specific materials
Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)
Thermo-mechanical
Title Diamond polishing
URI https://dx.doi.org/10.1016/j.diamond.2012.11.007
https://www.proquest.com/docview/1671422290
Volume 32
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