Multiscale computational fluid dynamics modeling of thermal atomic layer deposition with application to chamber design

[Display omitted] •Computational fluid dynamics modeling of ALD gas phase.•Multiscale CFD modeling of entire ALD chamber.•Numerical analysis of multiscale CFD model.•Chamber geometry optimization for spatial thin film uniformity. This work develops a first-principles-based three-dimensional, multisc...

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Vydané v:	Chemical engineering research & design Ročník 147; s. 529 - 544
Hlavní autori:	Zhang, Yichi, Ding, Yangyao, Christofides, Panagiotis D.
Médium:	Journal Article
Jazyk:	English
Vydavateľské údaje:	Rugby Elsevier B.V 01.07.2019 Elsevier Science Ltd
Predmet:	ALD cycle time optimization Algorithms Atomic interactions Atomic layer deposition Atomic layer epitaxy Atomic structure Chemical reactions Computational fluid dynamics Computational fluid dynamics modeling Computer simulation Cycle time Density functional theory Film growth First principles Fluid dynamics Geometry Geometry optimization Kinetic Monte Carlo modeling Mathematical models Message passing Microscopic modeling Monte Carlo simulation Nonuniformity Nuclear reactors Organic chemistry Parallel processing Phase transitions Silicon dioxide Thin films Three dimensional models Geometry optimization Computational fluid dynamics modeling Microscopic modeling Kinetic Monte Carlo modeling Atomic layer deposition ALD cycle time optimization
ISSN:	0263-8762, 1744-3563
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