Kim, D. H., & Hong, S. J. (2021). Use of Plasma Information in Machine-Learning-Based Fault Detection and Classification for Advanced Equipment Control. IEEE transactions on semiconductor manufacturing, 34(3), 408-419. https://doi.org/10.1109/TSM.2021.3079211
Chicago-Zitierstil (17. Ausg.)Kim, Dong Hwan, und Sang Jeen Hong. "Use of Plasma Information in Machine-Learning-Based Fault Detection and Classification for Advanced Equipment Control." IEEE Transactions on Semiconductor Manufacturing 34, no. 3 (2021): 408-419. https://doi.org/10.1109/TSM.2021.3079211.
MLA-Zitierstil (9. Ausg.)Kim, Dong Hwan, und Sang Jeen Hong. "Use of Plasma Information in Machine-Learning-Based Fault Detection and Classification for Advanced Equipment Control." IEEE Transactions on Semiconductor Manufacturing, vol. 34, no. 3, 2021, pp. 408-419, https://doi.org/10.1109/TSM.2021.3079211.