Monitoring the energy of the metal ion-content plasma-assisted deposition and its implication for bacterial inactivation

[Display omitted] •Differentiated effect of the plasma energy used to deposit Cu on PES is studied.•Distinct bacterial inactivation kinetics of E. coli were observed on Cu-PES samples.•The amounts of ions generated in the plasma phase were identified by mass spectrometry.•The effects of extracellula...

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Veröffentlicht in:Applied surface science Jg. 467-468; S. 749 - 752
Hauptverfasser: Rtimi, Sami, Nadtochenko, Victor, Khmel, Inessa, Konstantinidis, Stéphanos, Britun, Nikolay, Kiwi, John
Format: Journal Article
Sprache:Englisch
Veröffentlicht: Elsevier B.V 15.02.2019
Schlagworte:
Bacterial inactivation
Cu-ions
Cu-polyester
Magnetron sputtering
Porinless bacteria
Surface-contact effect
Porinless bacteria
Surface-contact effect
Cu-ions
Magnetron sputtering
Cu-polyester
Bacterial inactivation
ISSN:0169-4332, 1873-5584
Online-Zugang:Volltext
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Zusammenfassung:[Display omitted] •Differentiated effect of the plasma energy used to deposit Cu on PES is studied.•Distinct bacterial inactivation kinetics of E. coli were observed on Cu-PES samples.•The amounts of ions generated in the plasma phase were identified by mass spectrometry.•The effects of extracellular Cu-NPs and the intracellular Cu-ionic were investigated.•Bacterial inactivation kinetics were studied on E. coli and porinless E. coli. Cu-polyester (Cu-PES) was sputtered by high power impulse magnetron sputtering (HIPIMS) and by low energy direct current magnetron sputtering (DCMS). The total amount and distribution of the Ar+, Cu+ and Cu2+ ions were determined as well as the bacterial inactivation kinetics mediated by DCMS and HIPIMS samples. The separation of extracellular and intracellular processes leading to bacterial inactivation was assessed on normal and genetically modified E. coli.
ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2018.10.207