Fabrication of Cr-Si-N coatings using a hybrid high-power impulse and radio-frequency magnetron co-sputtering: The role of Si incorporation and duty cycle

Cr-Si-N thin films were successfully fabricated by a hybrid deposition system containing a high power impulse magnetron sputtering (HiPIMS) and a radio frequency (RF) magnetron in an Ar and N2 mixture. It can be found that the deposition rate of Cr-Si-N films increased with increasing power of RF an...

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Veröffentlicht in:Surface & coatings technology Jg. 403; S. 126378
Hauptverfasser: Diyatmika, Wahyu, Cheng, Chih-Yuan, Lee, Jyh-Wei
Format: Journal Article
Sprache:Englisch
Veröffentlicht: Lausanne Elsevier B.V 15.12.2020
Elsevier BV
Schlagworte:
Chromium nitride
Cr-Si-N films
Deposition
Grain refinement
Grain size
High power impulse magnetron sputtering
Hybrid systems
Magnetron sputtering
Mechanical properties
Modulus of elasticity
Radio frequency
Radio frequency magnetron sputtering
Silicon
Solid solutions
Surface roughness
Thin films
Wear rate
High power impulse magnetron sputtering
Radio frequency magnetron sputtering
Cr-Si-N films
ISSN:0257-8972, 1879-3347
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Zusammenfassung:Cr-Si-N thin films were successfully fabricated by a hybrid deposition system containing a high power impulse magnetron sputtering (HiPIMS) and a radio frequency (RF) magnetron in an Ar and N2 mixture. It can be found that the deposition rate of Cr-Si-N films increased with increasing power of RF and duty cycle of HiPIMS. Varying both HiPIMS duty cycle and RF power lead to a variation in Si content in the resulting Cr-Si-N films, indicating that the Si content in thin films is a crucial parameter. The Cr-Si-N film grown at a duty cycle of 2.5%, a repetition frequency of 1000 Hz, a HiPIMS average power of 500 W, and RF power of 450 W exhibits the highest Si content of 14.2 at.%, hardness of 31.5 GPa, elastic modulus of 292 GPa, the highest resistance to failure value of 0.1079, and the smallest grain size of 8 nm, average surface roughness of 0.7 nm and a wear rate of 0.50 × 10−6 mm3/N-m. The improved film properties can be attributed mainly to the incorporation of Si element. More importantly, the existence of Si atoms in CrN grains for forming solid solution (Cr,Si)N phase or extra Si atoms reacting with N atoms for forming amorphous Si3N4 (Si-N) phase segregated at the boundaries of the columnar CrN grains has strong influence on the microstructure and mechanical properties of thin films. The lower duty cycle of HiPIMS and higher Si content show synergistic effects on the grain refinement and enhanced mechanical properties of Cr-Si-N films in this work. •We deposit Cr-Si-N coatings using hybrid HiPIMS and RF co-sputtering.•Nanocrystalline microstructure is formed as Si content is high.•The lattice parameter and grain size of Cr-Si-N film decrease with increasing Si content.•The Cr-Si-N coating containing 14.2 at.% Si exhibits good mechanical properties.
Bibliographie:ObjectType-Article-1
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content type line 14
ISSN:0257-8972
1879-3347
DOI:10.1016/j.surfcoat.2020.126378