Mechanisms, models and methods of vapor deposition

The condensation and assembly of atomic fluxes incident upon the surface of a thin film during its growth by vapor deposition is complex. Mediating the growth process by varying the flux, adjusting the film temperature, irradiating the growth surface with energetic (assisting) particles or making se...

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Veröffentlicht in:	Progress in materials science Jg. 46; H. 3; S. 329 - 377
Hauptverfasser:	Wadley, H.N.G, Zhou, X, Johnson, R.A, Neurock, M
Format:	Journal Article
Sprache:	Englisch
Veröffentlicht:	New York, NY Elsevier Ltd 2001 Elsevier
Schlagworte:	Applied sciences Cross-disciplinary physics: materials science; rheology Exact sciences and technology Materials science Metals. Metallurgy Methods of deposition of films and coatings; film growth and epitaxy Physics Theory and models of film growth Ion beam Embedding Giant magnetoresistance Crystal growth from vapors Surface structure Thin films Multilayers Vapor deposition Monte Carlo methods Multiscale method Transition elements Molecular dynamics calculations Growth mechanism Density functional method Magnetic materials Modelling Ab initio calculations Electron density Diffusion Transition element alloys
ISSN:	0079-6425, 1873-2208
Online-Zugang:	Volltext
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