Yun, S., Tom, M., Ou, F., Orkoulas, G., & Christofides, P. D. (2022). Multivariable run-to-run control of thermal atomic layer etching of aluminum oxide thin films. Chemical engineering research & design, 182, 1-12. https://doi.org/10.1016/j.cherd.2022.03.039
Citace podle Chicago (17th ed.)Yun, Sungil, Matthew Tom, Feiyang Ou, Gerassimos Orkoulas, a Panagiotis D. Christofides. "Multivariable Run-to-run Control of Thermal Atomic Layer Etching of Aluminum Oxide Thin Films." Chemical Engineering Research & Design 182 (2022): 1-12. https://doi.org/10.1016/j.cherd.2022.03.039.
Citace podle MLA (9th ed.)Yun, Sungil, et al. "Multivariable Run-to-run Control of Thermal Atomic Layer Etching of Aluminum Oxide Thin Films." Chemical Engineering Research & Design, vol. 182, 2022, pp. 1-12, https://doi.org/10.1016/j.cherd.2022.03.039.