Hitschfeld, N., Villablanca, L., Krause, J., & Rivara, M. C. (2003). Improving the quality of meshes for the simulation of semiconductor devices using Lepp-based algorithms. International journal for numerical methods in engineering, 58(2), 333-347. https://doi.org/10.1002/nme.767
Citace podle Chicago (17th ed.)Hitschfeld, N., L. Villablanca, J. Krause, a M. C. Rivara. "Improving the Quality of Meshes for the Simulation of Semiconductor Devices Using Lepp-based Algorithms." International Journal for Numerical Methods in Engineering 58, no. 2 (2003): 333-347. https://doi.org/10.1002/nme.767.
Citace podle MLA (9th ed.)Hitschfeld, N., et al. "Improving the Quality of Meshes for the Simulation of Semiconductor Devices Using Lepp-based Algorithms." International Journal for Numerical Methods in Engineering, vol. 58, no. 2, 2003, pp. 333-347, https://doi.org/10.1002/nme.767.