Optimized circularly symmetric phase mask to extend the depth of focus

We propose a novel design method for a circularly symmetric phase mask to extend the depth of focus. Using the free-form rational function as the solution space, we optimize the profile of the phase mask by analysis of the axial intensity distribution, which can be calculated efficiently by employin...

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Bibliographic Details
Published in:	Journal of the Optical Society of America. A, Optics, image science, and vision Vol. 26; no. 8; p. 1889
Main Authors:	Zhou, Feng, Ye, Ran, Li, Guangwei, Zhang, Haitao, Wang, Dongsheng
Format:	Journal Article
Language:	English
Published:	United States 01.08.2009
ISSN:	1084-7529
Online Access:	Get more information
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Summary:	We propose a novel design method for a circularly symmetric phase mask to extend the depth of focus. Using the free-form rational function as the solution space, we optimize the profile of the phase mask by analysis of the axial intensity distribution, which can be calculated efficiently by employing the fast Fourier transform algorithm. Numerical comparisons prove the resulting rational phase mask's superiority to the existing quartic phase mask in intensity distribution and imaging performance.
Bibliography:	ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23
ISSN:	1084-7529
DOI:	10.1364/JOSAA.26.001889