Optimized circularly symmetric phase mask to extend the depth of focus
We propose a novel design method for a circularly symmetric phase mask to extend the depth of focus. Using the free-form rational function as the solution space, we optimize the profile of the phase mask by analysis of the axial intensity distribution, which can be calculated efficiently by employin...
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| Published in: | Journal of the Optical Society of America. A, Optics, image science, and vision Vol. 26; no. 8; p. 1889 |
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| Main Authors: | , , , , |
| Format: | Journal Article |
| Language: | English |
| Published: |
United States
01.08.2009
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| ISSN: | 1084-7529 |
| Online Access: | Get more information |
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