APA (7th ed.) Citation

Zhou, F., Ye, R., Li, G., Zhang, H., & Wang, D. (2009). Optimized circularly symmetric phase mask to extend the depth of focus. Journal of the Optical Society of America. A, Optics, image science, and vision, 26(8), 1889. https://doi.org/10.1364/JOSAA.26.001889

Chicago Style (17th ed.) Citation

Zhou, Feng, Ran Ye, Guangwei Li, Haitao Zhang, and Dongsheng Wang. "Optimized Circularly Symmetric Phase Mask to Extend the Depth of Focus." Journal of the Optical Society of America. A, Optics, Image Science, and Vision 26, no. 8 (2009): 1889. https://doi.org/10.1364/JOSAA.26.001889.

MLA (9th ed.) Citation

Zhou, Feng, et al. "Optimized Circularly Symmetric Phase Mask to Extend the Depth of Focus." Journal of the Optical Society of America. A, Optics, Image Science, and Vision, vol. 26, no. 8, 2009, p. 1889, https://doi.org/10.1364/JOSAA.26.001889.