Zhou, F., Ye, R., Li, G., Zhang, H., & Wang, D. (2009). Optimized circularly symmetric phase mask to extend the depth of focus. Journal of the Optical Society of America. A, Optics, image science, and vision, 26(8), 1889. https://doi.org/10.1364/JOSAA.26.001889
Citace podle Chicago (17th ed.)Zhou, Feng, Ran Ye, Guangwei Li, Haitao Zhang, a Dongsheng Wang. "Optimized Circularly Symmetric Phase Mask to Extend the Depth of Focus." Journal of the Optical Society of America. A, Optics, Image Science, and Vision 26, no. 8 (2009): 1889. https://doi.org/10.1364/JOSAA.26.001889.
Citace podle MLA (9th ed.)Zhou, Feng, et al. "Optimized Circularly Symmetric Phase Mask to Extend the Depth of Focus." Journal of the Optical Society of America. A, Optics, Image Science, and Vision, vol. 26, no. 8, 2009, p. 1889, https://doi.org/10.1364/JOSAA.26.001889.