Computational fluid dynamics modeling of a discrete feed atomic layer deposition reactor: Application to reactor design and operation
Novel transistor fabrication methods such as area-selective atomic layer deposition (AS-ALD) are crucial to improving nanopatterning, which is essential for facilitating transistor stacking in semiconducting wafers. However, transistor surfaces are subjected to nonuniformities during the initial AS-...
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| Vydáno v: | Computers & chemical engineering Ročník 178; s. 108400 |
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| Jazyk: | angličtina |
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Elsevier Ltd
01.10.2023
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| ISSN: | 0098-1354, 1873-4375 |
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| Abstract | Novel transistor fabrication methods such as area-selective atomic layer deposition (AS-ALD) are crucial to improving nanopatterning, which is essential for facilitating transistor stacking in semiconducting wafers. However, transistor surfaces are subjected to nonuniformities during the initial AS-ALD adsorption reactions that are attributed to steric hindrance effects. To minimize the role of steric hindrance generated by an oversaturation of reagent on the substrate surface, a discrete feed method is proposed for an ALD reactor configuration where reagent is introduced in short pulses through a perpendicular delivery system. An optimal reactor configuration is developed by modifying the inlet geometries of the reactor to ensure ideal fluid dynamics conditions (e.g., minimal vortices, radial flow distribution) are achieved. Detailed computational fluid dynamics simulations demonstrate the performance of the new reactor configuration and operational strategy.
•Computational fluid dynamics modeling of a discrete feed ALD reactor.•Optimization of reagent delivery system.•Minimization of steric hindrance effects.•Reactor optimal operation is determined. |
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| AbstractList | Novel transistor fabrication methods such as area-selective atomic layer deposition (AS-ALD) are crucial to improving nanopatterning, which is essential for facilitating transistor stacking in semiconducting wafers. However, transistor surfaces are subjected to nonuniformities during the initial AS-ALD adsorption reactions that are attributed to steric hindrance effects. To minimize the role of steric hindrance generated by an oversaturation of reagent on the substrate surface, a discrete feed method is proposed for an ALD reactor configuration where reagent is introduced in short pulses through a perpendicular delivery system. An optimal reactor configuration is developed by modifying the inlet geometries of the reactor to ensure ideal fluid dynamics conditions (e.g., minimal vortices, radial flow distribution) are achieved. Detailed computational fluid dynamics simulations demonstrate the performance of the new reactor configuration and operational strategy.
•Computational fluid dynamics modeling of a discrete feed ALD reactor.•Optimization of reagent delivery system.•Minimization of steric hindrance effects.•Reactor optimal operation is determined. |
| ArticleNumber | 108400 |
| Author | Tom, Matthew Yun, Sungil Wang, Henrik Ou, Feiyang Christofides, Panagiotis D. Orkoulas, Gerassimos |
| Author_xml | – sequence: 1 givenname: Matthew orcidid: 0000-0002-7892-7418 surname: Tom fullname: Tom, Matthew organization: Department of Chemical and Biomolecular Engineering, University of California, Los Angeles, CA, 90095-1592, USA – sequence: 2 givenname: Henrik surname: Wang fullname: Wang, Henrik organization: Department of Chemical and Biomolecular Engineering, University of California, Los Angeles, CA, 90095-1592, USA – sequence: 3 givenname: Feiyang orcidid: 0000-0002-1350-3657 surname: Ou fullname: Ou, Feiyang organization: Department of Chemical and Biomolecular Engineering, University of California, Los Angeles, CA, 90095-1592, USA – sequence: 4 givenname: Sungil surname: Yun fullname: Yun, Sungil organization: Department of Chemical and Biomolecular Engineering, University of California, Los Angeles, CA, 90095-1592, USA – sequence: 5 givenname: Gerassimos surname: Orkoulas fullname: Orkoulas, Gerassimos organization: Department of Chemical Engineering, Widener University, Chester, PA 19013, USA – sequence: 6 givenname: Panagiotis D. surname: Christofides fullname: Christofides, Panagiotis D. email: pdc@seas.ucla.edu organization: Department of Chemical and Biomolecular Engineering, University of California, Los Angeles, CA, 90095-1592, USA |
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| Keywords | Computational fluid dynamics modeling Area-selective atomic layer deposition Reactor optimal operation Semiconductor manufacturing processes Reactor optimal design |
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