Plasma information-based virtual metrology (PI-VM) and mass production process control

In this paper, we review the development of plasma engineering technology that improves dramatically the production efficiency of OLED (organic light-emitting diode) displays and semiconductor manufacturing by utilizing a process monitoring methodology based on the physical domain knowledge. The dom...

Full description

Saved in:

Bibliographic Details
Published in:	Journal of the Korean Physical Society Vol. 80; no. 8; pp. 647 - 669
Main Authors:	Park, Seolhye, Seong, Jaegu, Jang, Yunchang, Roh, Hyun-Joon, Kwon, Ji-Won, Lee, Jinyoung, Ryu, Sangwon, Song, Jaemin, Roh, Ki-Baek, Noh, Yeongil, Park, Yoona, Jang, Yongsuk, Cho, Taeyoung, Yang, Jae-Ho, Kim, Gon-Ho
Format:	Journal Article
Language:	English
Published:	Seoul The Korean Physical Society 01.04.2022 Springer Nature B.V
Subjects:	Algorithms Domains Fault detection Mass production Mathematical and Computational Physics Metrology Organic light emitting diodes Particle and Nuclear Physics Physical properties Physics Physics and Astronomy Plasma Plasma and Phenomenology Plasma chemistry Plasma diagnostics Plasmas (physics) Process controls Reaction kinetics Review - Fluids Sheaths Surface reactions Theoretical Virtual metrology Mass production CVD (chemical vapor deposition) FDC (fault detection and classification) APC (advanced process control) PI (plasma information) parameter Etching OLED (organic light-emitting diode)
ISSN:	0374-4884, 1976-8524
Online Access:	Get full text
Tags:	Add Tag No Tags, Be the first to tag this record!

Be the first to leave a comment!