APA (7th ed.) Citation

Park, S., Seong, J., Jang, Y., Roh, H., Kwon, J., Lee, J., . . . Kim, G. (2022). Plasma information-based virtual metrology (PI-VM) and mass production process control. Journal of the Korean Physical Society, 80(8), 647-669. https://doi.org/10.1007/s40042-022-00452-8

Chicago Style (17th ed.) Citation

Park, Seolhye, et al. "Plasma Information-based Virtual Metrology (PI-VM) and Mass Production Process Control." Journal of the Korean Physical Society 80, no. 8 (2022): 647-669. https://doi.org/10.1007/s40042-022-00452-8.

MLA (9th ed.) Citation

Park, Seolhye, et al. "Plasma Information-based Virtual Metrology (PI-VM) and Mass Production Process Control." Journal of the Korean Physical Society, vol. 80, no. 8, 2022, pp. 647-669, https://doi.org/10.1007/s40042-022-00452-8.