Sun, Y., Li, Y., Liao, G., Yuan, M., Wei, P., Li, Y., . . . Liu, L. (2022). Sampling-based imaging model for fast source and mask optimization in immersion lithography. Applied optics. Optical technology and biomedical optics, 61(2), 523. https://doi.org/10.1364/AO.437655
Citace podle Chicago (17th ed.)Sun, Yiyu, Yanqiu Li, Guanghui Liao, Miao Yuan, Pengzhi Wei, Yaning Li, Lulu Zou, a Lihui Liu. "Sampling-based Imaging Model for Fast Source and Mask Optimization in Immersion Lithography." Applied Optics. Optical Technology and Biomedical Optics 61, no. 2 (2022): 523. https://doi.org/10.1364/AO.437655.
Citace podle MLA (9th ed.)Sun, Yiyu, et al. "Sampling-based Imaging Model for Fast Source and Mask Optimization in Immersion Lithography." Applied Optics. Optical Technology and Biomedical Optics, vol. 61, no. 2, 2022, p. 523, https://doi.org/10.1364/AO.437655.