Origination and evolution of point defects in AlN film annealed at high temperature

While high temperature annealing has been proven to be an effective strategy to reduce threading dislocation density of AlN film, the point defect induced near-ultraviolet emission increases dramatically with the increase in annealing temperature, and thus limits its application in deep ultraviolet...

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Veröffentlicht in:Journal of luminescence Jg. 235; S. 118032
Hauptverfasser: Kai, Cuihong, Zang, Hang, Ben, Jianwei, Jiang, Ke, Shi, Zhiming, Jia, Yuping, Cao, Xingzhong, Lü, Wei, Sun, Xiaojuan, Li, Dabing
Format: Journal Article
Sprache:Englisch
Veröffentlicht: Elsevier B.V 01.07.2021
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ISSN:0022-2313, 1872-7883
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Abstract While high temperature annealing has been proven to be an effective strategy to reduce threading dislocation density of AlN film, the point defect induced near-ultraviolet emission increases dramatically with the increase in annealing temperature, and thus limits its application in deep ultraviolet optoelectronic devices. Herein, the origination and evolution of point defects in high-temperature annealed AlN are studied and clarified by photoluminescence spectroscopy, secondary ion mass spectrometry, positron annihilation and first-principles calculation. We have confirmed that (1) the annealing induces the increased O impurity concentration by two orders of magnitude; (2) The increase of O impurity concentration in AlN after high temperature annealing is the key factor that causes the evolution of point defects and the enhancement of near ultraviolet defect peak; (3) the formation of more O content [VAl-n(ON)] and VN at different annealing temperatures are responsible for photoluminescence evolution. Present work reveals the formation mechanism of point defects in AlN and provides further support for improving the quality of AlN. •The O point defects increase during the high temperature annealing process.•The VAl-2(ON) and VN defects are responsible for photoluminescence evolution.•The optical transition energies was evaluated by DFT calculations.
AbstractList While high temperature annealing has been proven to be an effective strategy to reduce threading dislocation density of AlN film, the point defect induced near-ultraviolet emission increases dramatically with the increase in annealing temperature, and thus limits its application in deep ultraviolet optoelectronic devices. Herein, the origination and evolution of point defects in high-temperature annealed AlN are studied and clarified by photoluminescence spectroscopy, secondary ion mass spectrometry, positron annihilation and first-principles calculation. We have confirmed that (1) the annealing induces the increased O impurity concentration by two orders of magnitude; (2) The increase of O impurity concentration in AlN after high temperature annealing is the key factor that causes the evolution of point defects and the enhancement of near ultraviolet defect peak; (3) the formation of more O content [VAl-n(ON)] and VN at different annealing temperatures are responsible for photoluminescence evolution. Present work reveals the formation mechanism of point defects in AlN and provides further support for improving the quality of AlN. •The O point defects increase during the high temperature annealing process.•The VAl-2(ON) and VN defects are responsible for photoluminescence evolution.•The optical transition energies was evaluated by DFT calculations.
ArticleNumber 118032
Author Sun, Xiaojuan
Ben, Jianwei
Shi, Zhiming
Cao, Xingzhong
Li, Dabing
Zang, Hang
Kai, Cuihong
Jia, Yuping
Jiang, Ke
Lü, Wei
Author_xml – sequence: 1
  givenname: Cuihong
  surname: Kai
  fullname: Kai, Cuihong
  organization: State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 3888 Dong Nan Hu Road, Changchun, 130033, People's Republic of China
– sequence: 2
  givenname: Hang
  orcidid: 0000-0002-1797-6857
  surname: Zang
  fullname: Zang, Hang
  organization: State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 3888 Dong Nan Hu Road, Changchun, 130033, People's Republic of China
– sequence: 3
  givenname: Jianwei
  surname: Ben
  fullname: Ben, Jianwei
  organization: State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 3888 Dong Nan Hu Road, Changchun, 130033, People's Republic of China
– sequence: 4
  givenname: Ke
  surname: Jiang
  fullname: Jiang, Ke
  organization: State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 3888 Dong Nan Hu Road, Changchun, 130033, People's Republic of China
– sequence: 5
  givenname: Zhiming
  orcidid: 0000-0002-1207-570X
  surname: Shi
  fullname: Shi, Zhiming
  organization: State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 3888 Dong Nan Hu Road, Changchun, 130033, People's Republic of China
– sequence: 6
  givenname: Yuping
  surname: Jia
  fullname: Jia, Yuping
  organization: State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 3888 Dong Nan Hu Road, Changchun, 130033, People's Republic of China
– sequence: 7
  givenname: Xingzhong
  orcidid: 0000-0001-5011-5912
  surname: Cao
  fullname: Cao, Xingzhong
  organization: Institute of High Energy Physics, Chinese Academy of Sciences, Beijing, 100049, China
– sequence: 8
  givenname: Wei
  surname:
  fullname: Lü, Wei
  email: lw771119@hotmail.com
  organization: State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 3888 Dong Nan Hu Road, Changchun, 130033, People's Republic of China
– sequence: 9
  givenname: Xiaojuan
  surname: Sun
  fullname: Sun, Xiaojuan
  organization: State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 3888 Dong Nan Hu Road, Changchun, 130033, People's Republic of China
– sequence: 10
  givenname: Dabing
  surname: Li
  fullname: Li, Dabing
  email: lidb@ciomp.ac.cn
  organization: State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 3888 Dong Nan Hu Road, Changchun, 130033, People's Republic of China
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Keywords AlN
Point defects
Evolution mechanism
High temperature annealing
Language English
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Snippet While high temperature annealing has been proven to be an effective strategy to reduce threading dislocation density of AlN film, the point defect induced...
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SubjectTerms AlN
Evolution mechanism
High temperature annealing
Point defects
Title Origination and evolution of point defects in AlN film annealed at high temperature
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