System-level evaluation of productivity and quality in semiconductor frontend fabrication integrating product and process models
In semiconductor manufacturing, photolithography represents the core process of frontend fabrication as the quality outcome in terms of overlay errors depends entirely on it. Hence, particular attention is devoted to the inspection of each wafer layer, having 100 % measurements of markers distribute...
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| Vydané v: | CIRP journal of manufacturing science and technology Ročník 60; s. 296 - 306 |
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| Jazyk: | English |
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Elsevier Ltd
01.09.2025
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| ISSN: | 1755-5817 |
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| Abstract | In semiconductor manufacturing, photolithography represents the core process of frontend fabrication as the quality outcome in terms of overlay errors depends entirely on it. Hence, particular attention is devoted to the inspection of each wafer layer, having 100 % measurements of markers distributed across a wafer with subsequent long inspection times. At the same time, process control is based on each layer’s overall measurements, discouraging companies from improving productivity by reducing inspection time. As a consequence, in this context, the product, process and system are extremely inter-related. Recent developments in joint product-process modelling show that robust model-based control coupled with optimal down-selection of measurement markers enables improved process control without decreasing the quality. However, when considering the system level effects, new dynamics should be accounted for in order to make decisions about production system configuration and operations. This paper proposes a novel analytical model for the evaluation of quality and productivity performance in manufacturing systems characterized by propagation of quality errors, process adaptation and alternative inspection policies. The proposed model is general, but particularly useful for the semiconductor sector. Application of this method to an industrial-scale semiconductor manufacturing system shows that when product-process-system are considered together, global optimal solutions can be achieved. |
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| AbstractList | In semiconductor manufacturing, photolithography represents the core process of frontend fabrication as the quality outcome in terms of overlay errors depends entirely on it. Hence, particular attention is devoted to the inspection of each wafer layer, having 100 % measurements of markers distributed across a wafer with subsequent long inspection times. At the same time, process control is based on each layer’s overall measurements, discouraging companies from improving productivity by reducing inspection time. As a consequence, in this context, the product, process and system are extremely inter-related. Recent developments in joint product-process modelling show that robust model-based control coupled with optimal down-selection of measurement markers enables improved process control without decreasing the quality. However, when considering the system level effects, new dynamics should be accounted for in order to make decisions about production system configuration and operations. This paper proposes a novel analytical model for the evaluation of quality and productivity performance in manufacturing systems characterized by propagation of quality errors, process adaptation and alternative inspection policies. The proposed model is general, but particularly useful for the semiconductor sector. Application of this method to an industrial-scale semiconductor manufacturing system shows that when product-process-system are considered together, global optimal solutions can be achieved. |
| Author | Magnanini, Maria Chiara Djurdjanovic, Dragan Tolio, Tullio Pomi, Riccardo |
| Author_xml | – sequence: 1 givenname: Maria Chiara orcidid: 0000-0002-0318-893X surname: Magnanini fullname: Magnanini, Maria Chiara email: mariachiara.magnanini@polimi.it organization: Department of Mechanical Engineering, Politecnico di Milano, Milano, Italy – sequence: 2 givenname: Dragan surname: Djurdjanovic fullname: Djurdjanovic, Dragan organization: Walker Department of Mechanical Engineering, The University of Texas at Austin, Austin, Texas, USA – sequence: 3 givenname: Riccardo orcidid: 0009-0006-8755-9182 surname: Pomi fullname: Pomi, Riccardo organization: Department of Mechanical Engineering, Politecnico di Milano, Milano, Italy – sequence: 4 givenname: Tullio surname: Tolio fullname: Tolio, Tullio organization: Department of Mechanical Engineering, Politecnico di Milano, Milano, Italy |
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| Keywords | Performance evaluation Zero-defect manufacturing Stochastic modelling Semiconductor manufacturing Quality control |
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