Detachment of CVD-grown graphene from single crystalline Ni films by a pure gas phase reaction

Despite great previous efforts there is still a high need for a simple, clean, and upscalable method for detaching epitaxial graphene from the metal support on which it was grown. We present a method based on a pure gas phase reaction that is free of solvents and polymer supports and avoids mechanic...

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Vydáno v:	Surface science Ročník 653; s. 143 - 152
Hlavní autoři:	Zeller, Patrick, Henß, Ann-Kathrin, Weinl, Michael, Diehl, Leo, Keefer, Daniel, Lippmann, Judith, Schulz, Anne, Kraus, Jürgen, Schreck, Matthias, Wintterlin, Joost
Médium:	Journal Article
Jazyk:	angličtina
Vydáno:	Elsevier B.V 01.11.2016
Témata:	CVD Gas phase etching Graphene transfer Mond process Monolayer graphene CVD Gas phase etching Monolayer graphene Mond process Ni Graphene transfer
ISSN:	0039-6028, 1879-2758
On-line přístup:	Získat plný text
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