Correlation between sputtering method, microstructure and properties of TiOx thin films deposited by reactive direct-current and high-power impulse magnetron sputtering

•TiOx films were deposited by magnetron sputtering at various oxygen flow fractions.•Microstructure, morphology and grain size of TiOx are affected by deposition method.•Correlation between phase constitution and particle energy distribution was studied. In this study, Titanium oxide (TiOx) thin fil...

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Veröffentlicht in:	Thin solid films Jg. 808; S. 140573
Hauptverfasser:	Lablali, Younes, Oubaki, Rachid, Ghailane, Anas, Alami, Jones, Makha, Mohammed
Format:	Journal Article
Sprache:	Englisch
Veröffentlicht:	Elsevier B.V 15.11.2024
Schlagworte:	Direct current magnetron sputtering Energy distribution function High-power impulse magnetron sputtering Oxygen flow rate Reactive magnetron sputtering SRIM calculations Oxygen flow rate Reactive magnetron sputtering Direct current magnetron sputtering High-power impulse magnetron sputtering SRIM calculations Energy distribution function
ISSN:	0040-6090
Online-Zugang:	Volltext
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