Correlation between sputtering method, microstructure and properties of TiOx thin films deposited by reactive direct-current and high-power impulse magnetron sputtering

•TiOx films were deposited by magnetron sputtering at various oxygen flow fractions.•Microstructure, morphology and grain size of TiOx are affected by deposition method.•Correlation between phase constitution and particle energy distribution was studied. In this study, Titanium oxide (TiOx) thin fil...

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Vydáno v:	Thin solid films Ročník 808; s. 140573
Hlavní autoři:	Lablali, Younes, Oubaki, Rachid, Ghailane, Anas, Alami, Jones, Makha, Mohammed
Médium:	Journal Article
Jazyk:	angličtina
Vydáno:	Elsevier B.V 15.11.2024
Témata:	Direct current magnetron sputtering Energy distribution function High-power impulse magnetron sputtering Oxygen flow rate Reactive magnetron sputtering SRIM calculations Oxygen flow rate Reactive magnetron sputtering Direct current magnetron sputtering High-power impulse magnetron sputtering SRIM calculations Energy distribution function
ISSN:	0040-6090
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