Correlation between sputtering method, microstructure and properties of TiOx thin films deposited by reactive direct-current and high-power impulse magnetron sputtering
•TiOx films were deposited by magnetron sputtering at various oxygen flow fractions.•Microstructure, morphology and grain size of TiOx are affected by deposition method.•Correlation between phase constitution and particle energy distribution was studied. In this study, Titanium oxide (TiOx) thin fil...
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| Vydané v: | Thin solid films Ročník 808; s. 140573 |
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| Hlavní autori: | , , , , |
| Médium: | Journal Article |
| Jazyk: | English |
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Elsevier B.V
15.11.2024
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| ISSN: | 0040-6090 |
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| Abstract | •TiOx films were deposited by magnetron sputtering at various oxygen flow fractions.•Microstructure, morphology and grain size of TiOx are affected by deposition method.•Correlation between phase constitution and particle energy distribution was studied.
In this study, Titanium oxide (TiOx) thin films were produced via reactive High-Power Impulse Magnetron Sputtering (HiPIMS) and reactive Direct-current Magnetron Sputtering (DcMS). The influence of oxygen reactive gas content on the structural, morphological, and optical characteristics of TiOx films was analyzed using various techniques including X-ray diffraction, scanning electron microscopy, energy dispersive X-ray spectroscopy, and UV–visible spectroscopy. We found that HiPIMS-deposited films exhibited a mixed anatase and rutile phase structure, while DcMS-deposited films showed a pure anatase structure. Additionally, HiPIMS deposited films demonstrated smaller grain sizes and smoother surfaces compared to DcMS deposited films. Elemental analysis revealed that HiPIMS-grown films were consistently over-stoichiometric, whereas a transition from sub to over-stoichiometric composition was observed in the DcMS-grown films. Moreover, the optical band gap values of TiOx films deposited via HiPIMS were higher than those deposited via DcMS, decreasing as the oxygen flow rate increased. TRIM calculations were employed to assess the average energy of particles reaching the growing film in both HiPIMS and DcMS depositions, confirming the observed structural differences. |
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| AbstractList | •TiOx films were deposited by magnetron sputtering at various oxygen flow fractions.•Microstructure, morphology and grain size of TiOx are affected by deposition method.•Correlation between phase constitution and particle energy distribution was studied.
In this study, Titanium oxide (TiOx) thin films were produced via reactive High-Power Impulse Magnetron Sputtering (HiPIMS) and reactive Direct-current Magnetron Sputtering (DcMS). The influence of oxygen reactive gas content on the structural, morphological, and optical characteristics of TiOx films was analyzed using various techniques including X-ray diffraction, scanning electron microscopy, energy dispersive X-ray spectroscopy, and UV–visible spectroscopy. We found that HiPIMS-deposited films exhibited a mixed anatase and rutile phase structure, while DcMS-deposited films showed a pure anatase structure. Additionally, HiPIMS deposited films demonstrated smaller grain sizes and smoother surfaces compared to DcMS deposited films. Elemental analysis revealed that HiPIMS-grown films were consistently over-stoichiometric, whereas a transition from sub to over-stoichiometric composition was observed in the DcMS-grown films. Moreover, the optical band gap values of TiOx films deposited via HiPIMS were higher than those deposited via DcMS, decreasing as the oxygen flow rate increased. TRIM calculations were employed to assess the average energy of particles reaching the growing film in both HiPIMS and DcMS depositions, confirming the observed structural differences. |
| ArticleNumber | 140573 |
| Author | Oubaki, Rachid Lablali, Younes Makha, Mohammed Ghailane, Anas Alami, Jones |
| Author_xml | – sequence: 1 givenname: Younes orcidid: 0009-0008-8245-5688 surname: Lablali fullname: Lablali, Younes organization: Materials Science, Energy and Nano-engineering department, University Mohammed VI Polytechnic (UM6P), Lot 660, Hay Moulay Rachid, Benguerir 43150, Morocco – sequence: 2 givenname: Rachid surname: Oubaki fullname: Oubaki, Rachid organization: Materials Science, Energy and Nano-engineering department, University Mohammed VI Polytechnic (UM6P), Lot 660, Hay Moulay Rachid, Benguerir 43150, Morocco – sequence: 3 givenname: Anas surname: Ghailane fullname: Ghailane, Anas organization: Avaluxe Coating Technologies GmbH & Co. KG // Georg. Benda Straße. 10 //, Fürth D-90763, Germany – sequence: 4 givenname: Jones orcidid: 0000-0002-4919-5350 surname: Alami fullname: Alami, Jones organization: Materials Science, Energy and Nano-engineering department, University Mohammed VI Polytechnic (UM6P), Lot 660, Hay Moulay Rachid, Benguerir 43150, Morocco – sequence: 5 givenname: Mohammed orcidid: 0000-0003-4917-1428 surname: Makha fullname: Makha, Mohammed email: mohammed.makha@um6p.ma organization: Materials Science, Energy and Nano-engineering department, University Mohammed VI Polytechnic (UM6P), Lot 660, Hay Moulay Rachid, Benguerir 43150, Morocco |
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| Keywords | Oxygen flow rate Reactive magnetron sputtering Direct current magnetron sputtering High-power impulse magnetron sputtering SRIM calculations Energy distribution function |
| Language | English |
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| SubjectTerms | Direct current magnetron sputtering Energy distribution function High-power impulse magnetron sputtering Oxygen flow rate Reactive magnetron sputtering SRIM calculations |
| Title | Correlation between sputtering method, microstructure and properties of TiOx thin films deposited by reactive direct-current and high-power impulse magnetron sputtering |
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