APA (7th ed.) Citation

Lablali, Y., Oubaki, R., Ghailane, A., Alami, J., & Makha, M. (2024). Correlation between sputtering method, microstructure and properties of TiOx thin films deposited by reactive direct-current and high-power impulse magnetron sputtering. Thin solid films, 808, 140573. https://doi.org/10.1016/j.tsf.2024.140573

Chicago Style (17th ed.) Citation

Lablali, Younes, Rachid Oubaki, Anas Ghailane, Jones Alami, and Mohammed Makha. "Correlation Between Sputtering Method, Microstructure and Properties of TiOx Thin Films Deposited by Reactive Direct-current and High-power Impulse Magnetron Sputtering." Thin Solid Films 808 (2024): 140573. https://doi.org/10.1016/j.tsf.2024.140573.

MLA (9th ed.) Citation

Lablali, Younes, et al. "Correlation Between Sputtering Method, Microstructure and Properties of TiOx Thin Films Deposited by Reactive Direct-current and High-power Impulse Magnetron Sputtering." Thin Solid Films, vol. 808, 2024, p. 140573, https://doi.org/10.1016/j.tsf.2024.140573.