Wang, H., Ou, F., Suherman, J., Orkoulas, G., & Christofides, P. D. (2025). Integration of on-line machine learning-based endpoint control and run-to-run control for an atomic layer etching process. Digital Chemical Engineering, 14, 100206. https://doi.org/10.1016/j.dche.2024.100206
Citácia podle Chicago (17th ed.)Wang, Henrik, Feiyang Ou, Julius Suherman, Gerassimos Orkoulas, a Panagiotis D. Christofides. "Integration of On-line Machine Learning-based Endpoint Control and Run-to-run Control for an Atomic Layer Etching Process." Digital Chemical Engineering 14 (2025): 100206. https://doi.org/10.1016/j.dche.2024.100206.
Citácia podľa MLA (8th ed.)Wang, Henrik, et al. "Integration of On-line Machine Learning-based Endpoint Control and Run-to-run Control for an Atomic Layer Etching Process." Digital Chemical Engineering, vol. 14, 2025, p. 100206, https://doi.org/10.1016/j.dche.2024.100206.