pNeurFill: Enhanced Neural Network Model-Based Dummy Filling Synthesis With Perimeter Adjustment

Dummy filling is widely applied to significantly improve the planarity of topographic patterns for the chemical mechanical polishing (CMP) process in VLSI manufacturing. In the dummy filling flow, dummy synthesis works as the key step to adjust the post-CMP profile height. However, existing dummy sy...

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Bibliographic Details
Published in:	IEEE transactions on computer-aided design of integrated circuits and systems Vol. 43; no. 2; p. 1
Main Authors:	Chen, Zhaoting, Cai, Junzhe, Yan, Changhao, Bi, Zhaori, Ma, Yuzhe, Yu, Bei, Hu, Wenchuang, Zhou, Dian, Zeng, Xuan
Format:	Journal Article
Language:	English
Published:	New York IEEE 01.02.2024 The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subjects:	Chemical mechanical polishing design for manufacturability Integrated circuit modeling Integrated circuits Iterative methods Layout metal fill synthesis Metals Multiprocessing neural network Neural networks Optimization Quadratic programming Semiconductor device modeling sequential quadratic programming Synthesis Wires
ISSN:	0278-0070, 1937-4151
Online Access:	Get full text
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